IP Library › Assignment 027785/0789
Patent Assignment
Reel/Frame 027785/0789

Assignment of Assignor's Interest

Recorded: 2012-02-29 Pages: 4
Assignors
DAVAL, NICOLAS
Executed: 2006-06-27
KERDILES, SEBASTIEN
Executed: 2006-06-30
AULNETTE, CECILE
Executed: 2006-06-27
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES S.A.
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES, 38190 BERNIN, FRANCE
Covered Property (1)
Method of Reducing Roughness of a Thick Insulating Layer
Patent: 8,183,128 →
Application: 12/234,280 →
Publication: US 2009/0023267
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 4, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 027800/0911 →