IP Library Assignment 027840/0144
Patent Assignment
Reel/Frame 027840/0144

Change of Name

Recorded: 2012-03-09 Pages: 2
Assignor
Assignee
CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
60 WOODLANDS INDUSTRIAL PARK D STREET 2, SINGAPORE, 738406, SINGAPORE
Covered Property (1)
Method for Reducing Sidewall Etch Residue
Patent: 8,153,527 →
Application: 12/249,970 →
Publication: US 2010/0091424
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 13, 2008
From: LOH, SOON YOONG; GOH, CAROL; TANG, KIN WAI; KONG, KIM FOONG
To: CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
Reel/Frame 021671/0292 →
Change of Name Mar 9, 2012
From: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 027840/0140 →
Assignment of Assignor's Interest Jul 2, 2019
From: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
To: ALSEPHINA INNOVATIONS INC.
Reel/Frame 049669/0775 →
Release of Security Interest Nov 19, 2020
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 054481/0673 →