Patent Assignment
Reel/Frame 027888/0924
Assignment of Assignor's Interest
Recorded: 2012-03-19
Pages: 2
Assignors
CHEN, CHAO-HSUING
Executed: 2012-02-07
WANG, LING-SUNG
Executed: 2012-02-02
LIN, CHI-YEN
Executed: 2012-02-07
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77 R.O.C., TAIWAN
Covered Property
(1)
Methods and Apparatus for Doped SiGe Source/Drain Stressor Deposition