IP Library Assignment 027987/0560
Patent Assignment
Reel/Frame 027987/0560

Assignment of Assignor's Interest

Recorded: 2012-04-04 Pages: 3
Assignors
CHOI, YOUNG-SEOK
Executed: 2012-04-03
KIM, DAE-YOUN
Executed: 2012-04-03
CHOI, SEUNG WOO
Executed: 2012-04-03
YOO, YONG MIN
Executed: 2012-04-03
KIM, JUNG SOO
Executed: 2012-04-03
Assignee
ASM GENITECH KOREA LTD.
514 SAMEUN-RI, JIKSAN-EUP, SEOBUK-GU, CHUNGCHEONGNAM-DO, CHEONAN-SI, 330-816, KOREA, REPUBLIC OF
Covered Property (1)
Lateral Flow Atomic Layer Deposition Device
Patent: 9,145,609 →
Application: 13/439,178 →
Publication: US 2012/0272900
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 21, 2019
From: ASM GENITECH KOREA, LTD.
To: ASM KOREA LTD.
Reel/Frame 048658/0249 →