Patent Assignment
Reel/Frame 048658/0249
Change of Name
Recorded: 2019-03-21
Pages: 9
Assignor
ASM GENITECH KOREA, LTD.
Executed: 2016-10-10
Assignee
ASM KOREA LTD.
514 SAMEUN-RI, JIKSAN-EUP, SEOBUK-GU, CHUNGCHEONGNAM-DO, CHEONAN-SI, KOREA, REPUBLIC OF
Covered Properties
(35)
Method for Forming a Three-Component Nitride Film Containing Metal and Silicon
Patent:
6,426,117 →
Application:
09/554,443 →
Chemical Vapor Deposition Method Using a Catalyst on a Substrate Surface
Patent:
6,623,799 →
Application:
09/554,444 →
Gas Feeding System for Chemical Vapor Deposition Reactor and Method of Controlling the Same
Patent:
6,432,205 →
Application:
09/554,535 →
Method of Vaporizing Liquid Sources and Apparatus Therefor
Patent:
6,380,081 →
Application:
09/718,837 →
Method of Forming a Thin Film
Patent:
6,645,574 →
Application:
09/719,103 →
Method of Forming Copper Interconnections and Thin Films Using Chemical Vapor Deposition with Catalyst
Chemical Deposition Reactor and Method of Forming a Thin Film Using the Same
Patent:
6,539,891 →
Application:
09/763,238 →
Thin Film Forming Method
Plasma Enhanced Atomic Layer Deposition (Peald) Equipment and Method of Forming a Conducting Thin Film Using the Same Thereof
Thin Film Forming Method
Method of Depositing Ru Films Having High Density
Method of Forming Metal Oxide
Atomic Layer Deposition Apparatus
Methods of Depositing a Ruthenium Film
Atomic Layer Deposition Apparatus
Thin Film Deposition Apparatus and Method Thereof
Deposition Apparatus
Thin Film Deposition Apparatus and Method of Maintaining the Same
Methods of Forming an Amorphous Silicon Thin Film
Plasma Processing Member, Deposition Apparatus Including the Same, and Depositing Method Using the Same
Lateral-Flow Deposition Apparatus and Method of Depositing Film by Using the Apparatus
Method of Forming Semiconductor Patterns
Atomic Layer Deposition Apparatus
Deposition Apparatus
Lateral Flow Atomic Layer Deposition Device
Lateral Flow Atomic Layer Deposition Apparatus and Atomic Layer Deposition Method Using the Same
Atomic Layer Deposition Apparatus
Apparatus Including 4-Way Valve for Fabricating Semiconductor Device, Method of Controlling Valve, and Method of Fabricating Semiconductor Device Using the Apparatus
Apparatus Including 4-Way Valve for Fabricating Semiconductor Device, Method of Controlling Valve, and Method of Fabricating Semiconductor Device Using the Apparatus
Lateral Flow Atomic Layer Deposition Apparatus and Atomic Layer Deposition Method Using the Same
Plasma Processing Member, Deposition Apparatus Including the Same, and Depositing Method Using the Same
Apparatus Including 4-Way Valve for Fabricating Semiconductor Device, Method of Controlling Valve, and Method of Fabricating Semiconductor Device Using the Apparatus
Substrate Transfer Device for Semiconductor Deposition Apparatus
Patent:
614,152 →
Application:
29/331,021 →
Plasma Inducing Plate for Semiconductor Deposition Apparatus
Patent:
606,952 →
Application:
29/331,022 →
Substrate Support for Semiconductor Deposition Apparatus
Patent:
614,593 →
Application:
29/331,023 →
Related Assignments
(7)
Other recorded transfers of the patents in this record — the chain of ownership.
Corrective Assignment to Correct the Corrective Assignment to Add an Assignee Inadvertently Omitted Previously Recorded on Reel 021238 Frame 0886. Assignor(S) Hereby Confirms the Assignment.
Sep 10, 2008
From: WON, SEOK-JUN; YOO, YONG-MIN; SONG, MIN-WOO; KIM, DAE-YOUN
To: SAMSUNG ELECTRONICS CO., LTD; ASM GENITECH KOREA LTD.
Reel/Frame 021519/0042 →
Assignment of Assignor's Interest
Oct 15, 2008
From: KIM, JONG SU; PARK, HYUNG SANG
To: ASM GENITECH KOREA LTD.
Reel/Frame 021687/0776 →
Assignment of Assignor's Interest
Dec 4, 2008
From: CHOI, SEUNG WOO; PARK, GWANG LAE; LEE, CHUN SOO; LEE, JEONG HO
To: ASM GENITECH KOREA LTD.
Reel/Frame 021929/0888 →
Assignment of Assignor's Interest
Dec 19, 2008
From: KIM, KI JONG; KIM, DAE YOUN
To: ASM GENITECH KOREA LTD.
Reel/Frame 022015/0965 →
Assignment of Assignor's Interest
Dec 19, 2008
From: PARK, HYUNG SANG; CHOI, SEUNG WOO; KIM, JONG SU; JUNG, DONG RAK
To: ASM GENITECH KOREA LTD.
Reel/Frame 022017/0330 →
Assignment of Assignor's Interest
Mar 12, 2009
From: KIM, SE YONG; KIM, WOO CHAN; JUNG, DONG RAK
To: ASM GENITECH KOREA LTD.
Reel/Frame 022391/0969 →
Assignment of Assignor's Interest
May 6, 2009
From: KIM, JONG SU; PARK, HYUNG SANG; YOO, YONG MIN; KWON, HAK YONG
To: ASM GENITECH KOREA LTD.
Reel/Frame 022648/0155 →