IP Library Granted Patent US 606,952
Granted Patent S1
US 606,952 · App. 29/331,022 · Granted Dec 29, 2009

Plasma inducing plate for semiconductor deposition apparatus

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Quick Facts
Patent No.
US 606,952
App. No.
29/331,022
Granted
Dec 29, 2009
Kind
S1
Claims (1)

The ornamental design for a plasma inducing plate for semiconductor deposition apparatus, as shown and described.

Assignments (2)
CHANGE OF NAME Recorded Mar 21, 2019
From: ASM GENITECH KOREA, LTD.
To: ASM KOREA LTD.
Reel/Frame 048658/0249 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 9, 2009
From: LEE, JEONG HO; JEONG, SANG JIN; KIM, WOO CHAN
To: ASM GENITECH KOREA LTD.
Reel/Frame 022236/0239 →