IP Library › Assignment 028124/0328
Patent Assignment
Reel/Frame 028124/0328

Assignment of Assignor's Interest

Recorded: 2012-04-30 Pages: 5
Assignors
CHUNG, SUK-JIN
Executed: 2012-04-26
LEE, JONG-CHEOL
Executed: 2012-04-26
KIM, YOUN-SOO
Executed: 2012-04-26
YOO, CHA-YOUNG
Executed: 2012-04-26
KANG, SANG-YEOL
Executed: 2012-04-26
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416, MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property (1)
Method of Forming an Oxide Layer and Method of Manufacturing Semiconductor Device Including the Oxide Layer
Patent: 9,076,647 →
Application: 13/459,136 →
Publication: US 2012/0276721