IP Library Assignment 028200/0188
Patent Assignment
Reel/Frame 028200/0188

Assignment of Assignor's Interest

Recorded: 2012-05-14 Pages: 3
Assignors
NETSU, SHIGEYOSHI
Executed: 2012-03-07
OGURO, KYOJI
Executed: 2012-03-14
SHIMIZU, TAKAAKI
Executed: 2012-03-09
KUROSAWA, YASUSHI
Executed: 2012-03-07
KUME, FUMITAKA
Executed: 2012-03-14
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, 100-0004, JAPAN
Covered Property (1)
Reactor for Producing Polycrystalline Silicon, System for Producing Polycrystalline Silicon, and Process for Producing Polycrystalline Silicon
Patent: 9,193,596 →
Application: 13/496,002 →
Publication: US 2012/0237429