IP Library › Assignment 028217/0623
Patent Assignment
Reel/Frame 028217/0623

Assignment of Assignor's Interest

Recorded: 2012-05-16 Pages: 2
Assignors
TOMIMATSU, SATOSHI
Executed: 2012-03-19
ONISHI, TSUYOSHI
Executed: 2012-03-21
AGEMURA, TOSHIHIDE
Executed: 2012-03-21
NANRI, TERUTAKA
Executed: 2012-03-19
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Charged Particle Beam Apparatus and Film Thickness Measurement Method
Patent: 8,680,465 →
Application: 13/498,994 →
Publication: US 2012/0187292
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →