IP Library › Assignment 028232/0461
Patent Assignment
Reel/Frame 028232/0461

Assignment of Assignor's Interest

Recorded: 2012-05-18 Pages: 3
Assignors
WANG, YUNYU
Executed: 2012-04-24
WANG, ANCHUAN
Executed: 2012-04-24
ZHANG, JINGCHUN
Executed: 2012-04-24
INGLE, NITIN K.
Executed: 2012-04-24
LEE, YOUNG S.
Executed: 2012-04-24
Assignee
APPLIED MATERIALS, INC.
3050 BOWERS AVENUE, SANTA CLARA, CALIFORNIA, 95054
Covered Property (1)
Selective Suppression of Dry-Etch Rate of Materials Containing Both Silicon and Nitrogen
Patent: 8,679,983 →
Application: 13/449,441 →
Publication: US 2013/0059440