Patent Assignment
Reel/Frame 028412/0861
Assignment of Assignor's Interest
Recorded: 2012-06-20
Pages: 4
Assignors
YAMAZAKI, SHUNPEI
Executed: 2012-05-15
MARUYAMA, TETSUNORI
Executed: 2012-05-17
IMOTO, YUKI
Executed: 2012-05-17
SATO, HITOMI
Executed: 2012-05-17
WATANABE, MASAHIRO
Executed: 2012-05-14
MASHIYAMA, MITSUO
Executed: 2012-05-14
OKAZAKI, KENICHI
Executed: 2012-05-14
NAKASHIMA, MOTOKI
Executed: 2012-05-22
SHIMAZU, TAKASHI
Executed: 2012-05-22
Assignee
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398, HASE, ATSUGI-SHI, KANAGAWA-KEN, 243-0036, JAPAN
Covered Property
(1)
Sputtering Target, Method for Manufacturing Sputtering Target, and Method for Forming Thin Film