IP Library › Assignment 028499/0431
Patent Assignment
Reel/Frame 028499/0431

Assignment of Assignor's Interest

Recorded: 2012-07-06 Pages: 4
Assignors
NAKASHIMA, NOBUAKI
Executed: 2012-05-08
ORIMOTO, YOSHIKI
Executed: 2012-05-08
Assignees
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, 105-8001, JAPAN
TOSHIBA MATERIALS CO., LTD.
8, SHINSUGITA-CHO, ISOGO-KU, YOKOHAMA-SHI, KANAGAWA, 235-8522, JAPAN
Covered Property (1)
Tantalum Sputtering Target and Method for Manufacturing the Same, and Method for Manufacturing Semiconductor Element
Patent: 8,747,633 →
Application: 13/470,800 →
Publication: US 2012/0267236
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Nunc Pro Tunc Assignment Feb 19, 2026
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MATERIALS CO. LTD.
Reel/Frame 074940/0511 →
Change of Name Feb 19, 2026
From: TOSHIBA MATERIALS CO. LTD.
To: NITERRA MATERIALS CO., LTD.
Reel/Frame 074941/0803 →
Change of Address Feb 19, 2026
From: KABUSHIKI KAISHA TOSHIBA
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 074941/0846 →