Patent Assignment
Reel/Frame 029086/0162
Assignment of Assignor's Interest
Recorded: 2012-10-05
Pages: 2
Assignors
AIGO, TAKASHI
Executed: 2012-07-25
TSUGE, HIROSHI
Executed: 2012-07-25
HOSHINO, TAIZO
Executed: 2012-07-25
FUJIMOTO, TATSUO
Executed: 2012-07-25
KATSUNO, MASAKAZU
Executed: 2012-07-25
NAKABAYASHI, MASASHI
Executed: 2012-07-25
YASHIRO, HIROKATSU
Executed: 2012-07-25
Assignee
NIPPON STEEL CORPORATION
6-1, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO, 100-8071, JAPAN
Covered Property
(1)
Process for Producing Epitaxial Silicon Carbide Single Crystal Substrate and Epitaxial Silicon Carbide Single Crystal Substrate Obtained by the Same
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger
Feb 7, 2013
From: NIPPON STEEL CORPORATION
To: NIPPON STEEL & SUMITOMO METAL CORPORATION
Reel/Frame 029769/0741 →
Assignment of Assignor's Interest
Apr 20, 2018
From: NIPPON STEEL & SUMITOMO METAL CORPORATION
To: SHOWA DENKO K.K.
Reel/Frame 045991/0704 →
Change of Name
Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →