IP Library Assignment 064082/0513
Patent Assignment
Reel/Frame 064082/0513

Change of Name

Recorded: 2023-06-23 Pages: 84
Assignor
SHOWA DENKO K.K.
Executed: 2023-06-23
Assignee
RESONAC CORPORATION
13-9, SHIBA DAIMON 1-CHOME, MINATO-KU,, TOKYO, 105-8518, JAPAN
Covered Properties (794)
Silver Nanowire Ink and Transparent Electroconductive Film
Application: 17/046,526 →
Publication: US US20210035702A1
Transparent Conductive Film, and Touch Panel Including Same
Application: 17/431,496 →
Publication: US US20220139591A1
Transparent Conducting Film
Application: 17/595,961 →
Publication: US US20230119637A1
Method for Producing Transparent Conducting Film
Application: 17/614,977 →
Publication: US US20220203738A1
Transparent Conducting Film Laminate and Processing Method Thereof
Application: 17/615,429 →
Publication: US US20220230774A1
Method for Producing Transparent Conducting Film
Application: 17/763,067 →
Publication: US US20220344072A1
Transparent Conducting Film Laminate and Processing Method Thereof
Application: 17/769,930 →
Publication: US US20220371310A1
Magnetic Sensor and Magnetic Sensor Manufacturing Method
Application: 17/290,813 →
Publication: US US20210373093A1
Magnetic Sensor and Magnetic Sensor Manufacturing Method
Application: 17/312,444 →
Publication: US US20220018911A1
Magnetic Sensor Circuit and Magnetic Field Detection Device
Application: 17/375,367 →
Publication: US US20220043076A1
Magnetic Sensor
Application: 17/457,299 →
Publication: US US20220196762A1
Magnetic Sensor
Application: 17/499,513 →
Publication: US US20220128634A1
Magnetic Sensor
Application: 17/526,159 →
Publication: US US20220206087A1
Method for Manufacturing Laminate
Application: 17/587,196 →
Publication: US US20230062863A1
Laminate, Released Laminate, and Method for Manufacturing Resonator
Application: 17/587,476 →
Publication: US US20230053754A1
Piezoelectric Film and Resonator
Application: 17/587,499 →
Publication: US US20230059734A1
Magnetization Measurement Device and Magnetization Measurement Method
Application: 17/596,032 →
Publication: US US20220317209A1
Magnetic Sensor
Application: 17/596,213 →
Publication: US US20220381853A1
Magnetic Sensor
Application: 17/609,657 →
Publication: US US20220236344A1
Magnetic Sensor
Application: 17/688,363 →
Publication: US US20220308126A1
Magnetic Sensor and Magnetic Sensor Device
Application: 17/691,504 →
Publication: US US20220308127A1
Magnetic Sensor
Application: 17/694,824 →
Publication: US US20220308124A1
Magnetic Sensor
Application: 17/701,968 →
Publication: US US20220308128A1
Magnetic Sensor
Application: 17/755,985 →
Publication: US US20220390531A1
Magnetic Sensor and Method for Manufacturing Magnetic Sensor
Application: 17/784,889 →
Publication: US US20230009139A1
Information Processing Device and Magnetic Sensor System
Application: 17/845,594 →
Publication: US US20220404439A1
Method for Producing Silicon-Containing Oxide-Coated Aluminum Nitride Particles and Method for Producing Exoergic Resin Composition
Application: 17/434,565 →
Publication: US US20220135805A1
Inorganic Particle Dispersion Resin Composition and Manufacturing Method of Inorganic Particle Dispersion Resin Composition
Application: 17/434,578 →
Publication: US US20220119619A1
Method for Producing Silica-Coated Boron Nitride Particles and Silica-Coated Boron Nitride Particles
Application: 17/601,459 →
Publication: US US20220195141A1
Silicon-Containing Oxide-Coated Aluminum Nitride Particle and Method of Manufacturing the Same
Application: 17/855,481 →
Publication: US US20220363912A1
Photosensitive Resin Composition
Application: 16/500,881 →
Publication: US US20200033726A1
Photosensitive Resin Composition, Organic El Element Barrier Rib, and Organic El Element
Application: 16/564,124 →
Publication: US US20200081343A1
Method for Producing Silica Carrier, and Silica Carrier
Application: 16/639,922 →
Publication: US US20200238255A1
Photosensitive Resin Composition, Organic El Element Barrier Rib, and Organic El Element
Application: 16/663,778 →
Publication: US US20200249572A1
Resin Composition, Polishing Pad, and Method for Producing Polishing Pad
Application: 16/977,719 →
Publication: US US20210054192A1
Composition, Method for Cleaning Adhesive Polymer, Method for Producing Device Wafer, and Method for Regenerating Support Wafer
Application: 17/269,692 →
Publication: US US20210317390A1
Method for Producing Alcohol and Catalyst for Producing Alcohol
Application: 17/288,382 →
Publication: US US20210380509A1
Fixed-Bed Multi-Tubular Reactor for Producing Alkenyl Acetate
Application: 17/289,352 →
Publication: US US20220314181A1
Decomposing/Cleaning Composition, Method for Cleaning Adhesive Polymer, and Method for Producing Device Wafer
Application: 17/420,569 →
Publication: US US20220119739A1
1,3-Butanediol
Application: 17/438,117 →
Publication: US US20220251011A1
Method for Producing Impregnated Pitch
Application: 17/595,653 →
Publication: US US20220220387A1
Method for Producing Alcohol
Application: 17/595,722 →
Publication: US US20220251009A1
Positive-Type Photosensitive Resin Composition and Partition Wall of Organic El Element
Application: 17/596,046 →
Publication: US US20220326614A1
Photosensitive Resin Composition and Organic El Element Partition Wall
Application: 17/613,384 →
Publication: US US20220221790A1
Method for Producing Alcohol
Application: 17/615,436 →
Publication: US US20220227691A1
Method for Recovering Olefin
Application: 17/615,466 →
Publication: US US20220234024A1
Plant Vitalizing Agent Containing Exogenous Elicitor and Endogenous Elicitor and Use Thereof
Application: 17/619,627 →
Publication: US US20220354116A1
Plant Vitalizer Containing Cello-Oligosaccharide, and Use for Said Plant Vitalizer
Application: 17/619,801 →
Publication: US US20220369568A1
Plant Activator Containing Amino Acid or Salt Thereof, and Oligosaccharide, and Use Thereof
Application: 17/619,821 →
Publication: US US20220369569A1
Composition, and Method for Cleaning Adhesive Polymer
Application: 17/634,625 →
Publication: US US20220290078A1
Photosensitive Resin Composition and Organic El Element Partition Wall
Application: 17/637,622 →
Publication: US US20220275241A1
Method for Producing Decomposing/Cleaning Composition
Application: 17/774,025 →
Publication: US US20220380704A1
Composition, and Method for Cleaning Adhesive Polymer
Application: 17/791,070 →
Publication: US US20230039366A1
Method for Manufacturing Fertilizer
Application: 17/917,743 →
Publication: US US20230159402A1
Bumper Reinforcement for Automobile
Patent: 999,690 →
Application: 29/799,131 →
Bumper Reinforcement for Automobile
Patent: 997,058 →
Application: 29/799,156 →
Stiffened Member Used for Bumper Reinforcement for Automobile
Patent: 997,059 →
Application: 29/799,159 →
Bumper Reinforcement for Automobile
Patent: 997,060 →
Application: 29/799,163 →
Stiffened Member Used for Bumper Reinforcement for Automobile
Patent: 997,061 →
Application: 29/799,191 →
Bumper Reinforcement for Automobile
Patent: 997,803 →
Application: 29/799,130 →
Bumper Reinforcement for Automobile
Patent: 997,057 →
Application: 29/799,125 →
Bumper Reinforcement for Automobile
Patent: 997,802 →
Application: 29/799,120 →
Production Method for Aqueous Solution of Zinc Halide
Application: 16/612,480 →
Publication: US US20200095132A1
Method of Producing Boron Trichloride
Application: 17/052,844 →
Publication: US US20210246040A1
Method of Producing Boron Trichloride
Application: 17/054,548 →
Publication: US US20210230010A1
Anode for Electrolytic Synthesis and Method for Producing Fluorine Gas or Fluorine Containing Compound
Application: 17/263,616 →
Publication: US US20210292923A1
Anode for Electrolytic Synthesis and Method for Producing Fluorine Gas
Application: 17/266,728 →
Publication: US US20210310138A1
Method and Supply Equipment for Supplying Fluorine Gas-Containing Gas
Application: 17/270,679 →
Publication: US US20210341103A1
Fluorine Gas Production Device
Application: 17/279,670 →
Publication: US US20210395901A1
Adhesion Removal Method and Film-Forming Method
Application: 17/414,376 →
Publication: US US20220064777A1
Adhesion Removal Method and Film-Forming Method
Application: 17/417,912 →
Publication: US US20220059327A1
Adhesion Removal Method and Film-Forming Method
Application: 17/418,344 →
Publication: US US20220064788A1
Composition for Adhesives, Outer Package Material for Electricity Storage Devices, and Method for Producing Same
Application: 17/428,823 →
Publication: US US20220127498A1
Etching Method for Silicon Nitride and Production Method for Semiconductor Element
Application: 17/595,351 →
Publication: US US20220216062A1
Etching Method and Method for Manufacturing Semiconductor Element
Application: 17/595,397 →
Publication: US US20220216063A1
Gas Treatment Method and Gas Treatment Device
Application: 17/595,409 →
Publication: US US20220193597A1
Corrosion-Resistant Member
Application: 17/595,413 →
Publication: US US20220195605A1
Etching Method
Application: 17/595,416 →
Publication: US US20220199419A1
Dry Etching Method, Production Method for Semiconductor Element, and Cleaning Method
Application: 17/595,585 →
Publication: US US20220230888A1
Sulfur Dioxide Mixture, and Method of Producing the Same, and Filling Container
Application: 17/595,708 →
Publication: US US20220250908A1
Method for Producing Fluorine Gas and Device for Producing Fluorine Gas
Application: 17/595,713 →
Publication: US US20220251716A1
Method for Producing Fluorine Gas
Application: 17/595,873 →
Publication: US US20220234890A1
Adhered Substance Removing Method and Film-Forming Method
Application: 17/595,955 →
Publication: US US20220157599A1
Method for Producing Fluorine Gas and Device for Producing Fluorine Gas
Application: 17/595,958 →
Publication: US US20220154353A1
Method for Producing Fluorine Gas and Device for Producing Fluorine Gas
Application: 17/595,964 →
Publication: US US20220228272A1
Metal Removal Method, Dry Etching Method, and Production Method for Semiconductor Element
Application: 17/607,933 →
Publication: US US20220325418A1
Method for Producing Bromine Pentafluoride
Application: 17/610,187 →
Publication: US US20220219982A1
Method for Removing Metal Compound
Application: 17/611,607 →
Publication: US US20220243128A1
Plasma Etching Method
Application: 17/611,754 →
Publication: US US20220254607A1
Corrosion-Resistant Member
Application: 17/611,768 →
Publication: US US20220251699A1
Dry Etching Method, Method for Manufacturing Semiconductor Element, and Cleaning Method
Application: 17/612,774 →
Publication: US US20230154763A1
Method of Manufacturing Passivation Film
Application: 17/612,783 →
Publication: US US20220246447A1
Corrosion-Resistant Member
Application: 17/612,871 →
Publication: US US20220243072A1
Method for Producing Fluorine Gas and Device for Producing Fluorine Gas
Application: 17/613,865 →
Publication: US US20220213605A1
Method for Producing Fluorine Gas and Device for Producing Fluorine Gas
Application: 17/613,867 →
Publication: US US20220275523A1
Device for Producing Fluorine Gas and Light Scattering Detector
Application: 17/614,801 →
Publication: US US20220228273A1
Method for Removing Adhering Material and Film Forming Method
Application: 17/615,308 →
Publication: US US20220220612A1
Method for Producing Fluorine Gas and Device for Producing Fluorine Gas
Application: 17/615,485 →
Publication: US US20220235471A1
Adhesive Agent and Adhesion Method
Application: 17/618,114 →
Publication: US US20220243101A1
CRUCIBLE AND SiC SINGLE CRYSTAL GROWTH APPARATUS
Application: 16/391,556 →
Publication: US US20190330764A1
P-Type Sic Epitaxial Wafer and Production Method Therefor
Application: 16/471,784 →
Publication: US US20190316273A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 16/489,896 →
Publication: US US20200002258A1
Magnetic Recording Medium, Fluorine-Containing Ether Compound and Lubricant for Magnetic Recording Medium
Application: 16/489,931 →
Publication: US US20200010619A1
Oil-Repellent Composition
Application: 16/490,924 →
Publication: US US20200010691A1
n-TYPE 4H-SiC SINGLE CRYSTAL SUBSTRATE AND METHOD OF PRODUCING n-TYPE 4H-SiC SINGLE CRYSTAL SUBSTRATE
Application: 16/553,302 →
Publication: US US20200071849A1
SiC SINGLE CRYSTAL MANUFACTURING APPARATUS
Application: 16/558,643 →
Publication: US US20200080227A1
Single Crystal Growth Crucible and Single Crystal Growth Method
Application: 16/559,863 →
Publication: US US20200080233A1
Sic Single Crystal Production Apparatus
Application: 16/601,915 →
Publication: US US20200123679A1
SiC EPITAXIAL WAFER AND METHOD FOR MANUFACTURING SAME
Application: 16/620,088 →
Publication: US US20200203163A1
Anode Mounting Member of Fluorine Electrolytic Cell, Fluorine Electrolytic Cell, and Method for Producing Fluorine Gas
Application: 16/624,938 →
Publication: US US20210332487A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 16/640,132 →
Publication: US US20210188766A1
Susceptor, Cvd Apparatus, and Method for Manufacturing Epitaxial Wafer
Application: 16/644,250 →
Publication: US US20210066113A1
METHOD OF PRODUCING SiC SINGLE CRYSTAL INGOT
Application: 16/693,682 →
Publication: US US20200165743A1
METHOD OF ACQUIRING SAMPLE FOR EVALUATION OF SiC SINGLE CRYSTAL
Application: 16/702,180 →
Publication: US US20200182752A1
Susceptor and Chemical Vapor Deposition Apparatus
Application: 16/705,848 →
Publication: US US20200181798A1
Sic Chemical Vapor Deposition Apparatus
Application: 16/717,326 →
Publication: US US20200199745A1
SiC SINGLE CRYSTAL GROWTH CRUCIBLE, SiC SINGLE CRYSTAL MANUFACTURING METHOD, AND SiC SINGLE CRYSTAL MANUFACTURING APPARATUS
Application: 16/734,966 →
Publication: US US20200224328A1
Fullerene-Containing Lubricating Oil Composition and Method for Producing Same
Application: 16/758,122 →
Publication: US US20210371763A1
Method for Producing Slurry for Nonaqueous Battery Electrodes
Application: 16/766,986 →
Publication: US US20200395613A1
SiC SINGLE CRYSTAL, AND SiC INGOT
Application: 16/905,337 →
Publication: US US20200318254A1
Binder Including Copolymer of Styrene, (Meth)Acrylate, and Surfactant Having Unsaturated Bond, Slurry Having the Same, Nonaqueous Battery Electrode Using the Same, and Nonaqueous Battery Using the Same
Application: 16/957,324 →
Publication: US US20200350590A1
METHOD OF EVALUATING SiC SUBSTRATE, METHOD OF MANUFACTURING SiC EPITAXIAL WAFER, AND METHOD OF MANUFACTURING SiC DEVICE
Application: 17/009,130 →
Publication: US US20210063321A1
SiC SUBSTRATE AND SiC SINGLE CRYSTAL MANUFACTURING METHOD
Application: 17/113,220 →
Publication: US US20210172085A1
Susceptor and Chemical Vapor Deposition Apparatus
Application: 17/211,634 →
Publication: US US20210217648A1
Copolymer for Binder for Non-Aqueous Battery Electrode, and Slurry for Producing Non-Aqueous Battery Electrode
Application: 17/260,440 →
Publication: US US20210296651A1
Composition, Production Method for Composition, and Production Method for Unsaturated Compound
Application: 17/263,596 →
Publication: US US20210292469A1
Raw Material Composition for Polyisocyanurate and Method for Producing Polyisocyanurate
Application: 17/266,847 →
Publication: US US20210292462A1
Composition, Production Method for Composition, and Production Method for Unsaturated Compound
Application: 17/269,059 →
Publication: US US20210276943A1
Composition, Production Method for Composition, and Production Method for Unsaturated Compound
Application: 17/269,147 →
Publication: US US20220119585A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/274,466 →
Publication: US US20220049176A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/274,702 →
Publication: US US20220048882A1
Oil-In-Water-Type Skin External Agent
Application: 17/288,983 →
Publication: US US20210401681A1
Guard Column and Method for Producing Guard Column
Application: 17/311,437 →
Publication: US US20220023832A1
Dummy Substrate and Manufacturing Method Thereof
Application: 17/410,589 →
Publication: US US20220068304A1
Titanium Oxide Production Method
Application: 17/431,343 →
Publication: US US20220135422A1
Probe Production Method and Surface Observation Method
Application: 17/435,426 →
Publication: US US20220050125A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium and Magnetic Recording Medium
Application: 17/437,251 →
Publication: US US20220169941A1
SiC EPITAXIAL WAFER AND METHOD FOR MANUFACTURING SIC EPITAXIAL WAFER
Application: 17/454,416 →
Publication: US US20220149160A1
Method of Inspecting Lubricating Oil Composition and Method of Producing Lubricating Oil Composition
Application: 17/526,346 →
Publication: US US20220074840A1
Crucible Having an Improved Crystal Growth Base for Manufacturing Silicon Carbide Single Crystal and Method of Use
Application: 17/562,438 →
Publication: US US20220205137A1
Highly Heat-Resistant Anatase-Type Titanium Oxide and Method for Producing the Same
Application: 17/595,895 →
Publication: US US20220324719A1
Lubricating Oil Composition, Method for Producing Same and Vacuum Apparatus
Application: 17/605,282 →
Publication: US US20220220409A1
Method for Producing Lubricating Oil Composition, and Lubricating Oil Composition
Application: 17/605,309 →
Publication: US US20220228084A1
Lubricating Oil Composition and Method for Producing Lubricating Oil Composition
Application: 17/605,320 →
Publication: US US20220186136A1
Cancer Cell Proliferation Suppression Agent and Composition for Suppressing Proliferation of Cancer Cells
Application: 17/610,190 →
Publication: US US20220257621A1
Agent for Protection Against Atmospheric Pollutants and Composition for Protection Against Atmospheric Pollutants
Application: 17/610,284 →
Publication: US US20220211605A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/630,594 →
Publication: US US20230257521A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/630,639 →
Publication: US US20240034951A2
Water-In-Oil Emulsion Composition
Application: 17/632,725 →
Publication: US US20220280396A1
SiC growth apparatus comprised of a base having a plurality of graphite plates having anisotropy of a thermal expansion coefficient and method of manufacturing a SiC crystal using the apparatus
Application: 17/646,062 →
Publication: US US20220213617A1
SiC EPITAXIAL WAFER, PRODUCTION METHOD THEREFOR, AND DEFECT IDENTIFICATION METHOD
Application: 17/683,176 →
Publication: US US20220259764A1
EVALUATION METHOD AND MANUFACTURING METHOD OF SiC EPITAXIAL WAFER
Application: 17/707,743 →
Publication: US US20220223482A1
Mixture of Inositol Derivatives
Application: 17/714,240 →
Publication: US US20220226358A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/760,973 →
Publication: US US20220372390A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/764,386 →
Publication: US US20220356159A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium and Magnetic Recording Medium
Application: 17/765,175 →
Publication: US US20220380695A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/772,043 →
Publication: US US20230002696A1
Electrode Binder for a Nonaqueous Secondary Battery and Nonaqueous Secondary Battery Electrode
Application: 17/777,509 →
Publication: US US20230357469A1
Nonaqueous Secondary Battery Electrode, Electrode Slurry, and Nonaqueous Secondary Battery
Application: 17/777,530 →
Publication: US US20230335737A1
Method for Evaluating Orientation of Nanowire in Transparent Material, Method for Managing Steps in Which Said Method Is Used, and Method for Producing Resin Cured Article
Application: 17/785,527 →
Publication: US US20230025211A1
Production Method for Polymer Composition
Application: 17/785,610 →
Publication: US US20230027915A1
Acceleration Sensor, Acceleration Evaluation Method Using Same, and Load Provided with Acceleration Sensor
Application: 17/785,709 →
Publication: US US20230055947A1
High-Molecular-Weight Polymer Sheet and Method for Producing Same
Application: 17/785,735 →
Publication: US US20230046460A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/788,075 →
Publication: US US20230090239A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/788,125 →
Publication: US US20230120626A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/788,169 →
Publication: US US20230099918A1
Radically Polymerizable Resin Composition and Cured Product Thereof
Application: 17/788,455 →
Publication: US US20230058675A1
Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
Application: 17/797,177 →
Publication: US US20230115042A1
Horizontal Continuous Casting Apparatus and Method for Manufacturing Aluminum Alloy Cast Rod Using the Same
Application: 17/861,712 →
Publication: US US20230023546A1
SiC EPITAXIAL WAFER AND METHOD FOR MANUFACTURING SiC EPITAXIAL WAFER
Application: 17/862,933 →
Publication: US US20230026927A1
SiC EPITAXIAL WAFER AND METHOD FOR MANUFACTURING SiC EPITAXIAL WAFER
Application: 17/879,118 →
Publication: US US20230039660A1
SiC EPITAXIAL WAFER AND METHOD OF MANUFACTURING SiC EPITAXIAL WAFER
Application: 17/879,474 →
Publication: US US20230038132A1
SiC INGOT AND SiC WAFER
Application: 17/965,965 →
Publication: US US20230122232A1
SiC EPITAXIAL WAFER, AND METHOD OF MANUFACTURING THE SAME
Application: 17/981,138 →
Publication: US US20230055999A1
Nitrous Oxide Purification Method
Application: 17/267,255 →
Publication: US US20210309520A1
Packing Material for Ion Chromatography and Production Method Therefor
Application: 17/268,623 →
Publication: US US20210237034A1
Etching Method Using Halogen Fluoride and Method for Producing Semiconductor
Application: 17/414,041 →
Publication: US US20220051898A1
Method for Removing Halogen Fluoride, Quantitative Analysis Method for Gas Component Contained in Halogen Fluoride Mixed Gas, and Quantitative Analyzer
Application: 17/416,807 →
Publication: US US20220054972A1
Method for Producing Chloroprene Polymer Latex
Application: 17/418,529 →
Publication: US US20220056246A1
Chloroprene Polymer Latex and Method for Producing Same
Application: 17/418,556 →
Publication: US US20220162427A1
Method for Producing Chloroprene Graft Copolymer Latex, Adhesive Containing Same and Adhesion Method
Application: 17/421,061 →
Publication: US US20220064354A1
Isoprene-Based Polymer Latex Composition
Application: 17/421,149 →
Publication: US US20220073657A1
Method for Producing Aqueous Solution of N-Vinyl Carboxylic Acid Amide Copolymer
Application: 17/439,449 →
Publication: US US20220153897A1
Packing Material for Size Exclusion Chromatography and Method for Producing the Same
Application: 17/591,774 →
Publication: US US20220176273A1
Laminate
Application: 17/595,570 →
Publication: US US20220235468A1
Method for Producing Highly Polymerizable N-Vinyl Carboxylic Acid Amide Monomer
Application: 17/595,783 →
Publication: US US20220227697A1
Method for Producing Highly Polymerizable N-Vinyl Carboxylic Acid Amide Monomer
Application: 17/595,785 →
Publication: US US20220220063A1
Method for Producing Highly Polymerizable N-Vinyl Carboxylic Acid Amide Monomer
Application: 17/595,786 →
Publication: US US20220220064A1
Method for Measuring Concentration of Fluorine Gas in Halogen Fluoride-Containing Gas Using Mass Spectrometer
Application: 17/608,527 →
Publication: US US20220223397A1
Method for Measuring Concentration of Fluorine Gas Contained in Halogen Fluoride-Containing Gas by Ultraviolet Spectroscopy
Application: 17/609,211 →
Publication: US US20220214323A1
Electrically Conductive Polymer Composition and Method for Stably Storing Electrically Conductive Polymer Solution
Application: 17/611,317 →
Publication: US US20220215981A1
Composition for Aqueous Coating Liquid
Application: 17/612,006 →
Publication: US US20220228018A1
Method for Producing Highly Polymerizable N-Vinyl Carboxlyic Acid Amide Monomer
Application: 17/614,143 →
Publication: US US20220251026A1
Method for Producing Highly Polymerizable N-Vinyl Carboxylic Acid Amide Monomer
Application: 17/614,153 →
Publication: US US20220213025A1
Laminate and Method for Producing Same
Application: 17/614,172 →
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Packing Material for Hilic Columns, Hilic Column Filled with Same, and Method for Analyzing Oligosaccharide with Use of Same
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SiC EPITAXIAL WAFER CONTAINING LARGE PIT DEFECTS WITH A SURFACE DENSITY OF 0.5 DEFECTS/CM2 OR LESS, AND PRODUCTION METHOD THEREFOR
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n-TYPE SiC SINGLE CRYSTAL SUBSTRATE, METHOD FOR PRODUCING SAME AND SiC EPITAXIAL WAFER
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Method of Producing Heat-Dissipating Unit
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Curing Accelerator and Radical Polymerizable Resin Composition
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SiC SINGLE CRYSTAL GROWTH APPARATUS CONTAINING MOVABLE HEAT-INSULATING MATERIAL AND GROWTH METHOD OF SiC SINGLE CRYSTAL USING THE SAME
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Heat-Insulating Shield Member and Single Crystal Manufacturing Apparatus Having the Same
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Shielding Member Including a Plurality of Shielding Plates Arranged Without Gaps Therebetween in Plan View and Apparatus for Growing Single Crystals
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Shielding Member and Single Crystal Growth Device Having the Same
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Magnetic Recording Medium and Magnetic Storage Apparatus
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Heat-Assisted Magnetic Recording Medium and Magnetic Storage Apparatus
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Aluminum Alloy Plastic Worked Article, Method for Manufacturing the Same, and Automobile Component
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Assisted Magnetic Recording Medium and Magnetic Storage Apparatus
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Heat-Assisted Magnetic Recording Medium and Magnetic Storage Apparatus
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Transparent Conductive Substrate and Method for Producing Same
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Composition for Forming Protective Film for Electroconductive Pattern, Protective Film for Electroconductive Pattern, Method for Producing Protective Film, and Method for Producing Transparent Electroconductive Film
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MANUFACTURING METHOD OF SiC INGOT
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Method for Producing Silicon Carbide Single Crystal
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Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium and Magnetic Recording Medium
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SiC WAFER DEFECT MEASURING METHOD, REFERENCE SAMPLE, AND METHOD OF MANUFACTURING SiC EPITAXIAL WAFER
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Radiator for Liquid Cooling Type Cooling Device and Method of Producing the Same
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Method for Manufacturing Solid Electrolytic Capacitor
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Hexagonal Boron Nitride Powder, Method for Producing Same, Resin Composition and Resin Sheet
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Method for Producing Polyisothianaphthene-Based Electroconductive Polymer
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Fused Heteropolycyclic Compound, and Method for Producing Conductive Polymer in Which Said Compound Is Used
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Methods for Producing Transparent Conductive Film and Transparent Conductive Pattern
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Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
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Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
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Alumina Sintered Body, Abrasive Grain, and Grinding Wheel
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Packing Material for Size Exclusion Chromatography and Method for Producing the Same
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Lubricant for Magnetic Recording Medium, and Method for Producing Magnetic Recording Medium
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Pedestal for Supporting a Seed for Sic Single Crystal Growth Which Includes a Gas-Permeable Region of Reduced Thickness
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MANUFACTURING METHOD AND EVALUATION METHOD FOR SiC DEVICE
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Heat-Assisted Magnetic Recording Medium and Magnetic Storage Apparatus
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Crystal Growth Apparatus with Controlled Center Position of Heating
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Shielding Member and Apparatus for Single Crystal Growth
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SiC SUBSTRATE EVALUATION METHOD, SiC EPITAXIAL WAFER MANUFACTURING METHOD, AND SiC EPITAXIAL WAFER
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Crystal Growth Apparatus
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Thermal Conductivity Measuring Device, Heating Device, Thermal Conductivity Measuring Method, and Quality Assurance Method
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METHOD OF MANUFACTURING SiC SINGLE CRYSTAL AND COVERING MEMBER
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Single Crystal Growth Method Which Includes Covering a Part of a Surface of a Raw Material for Sublimation with a Metal Carbide Powder
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SiC SUBSTRATE EVALUATION METHOD AND METHOD FOR MANUFACTURING SiC EPITAXIAL WAFER
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Publication: US US20200116649A1
SiC SUBSTRATE, SiC EPITAXIAL WAFER, AND METHOD OF MANUFACTURING THE SAME
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Adhesive, Laminate, Packaging Material for Battery Casing, Battery Case, and Method of Producing Battery Case
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Separation/Analysis Method for Mixture of Oligonucleotides
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Production Method for Hexafluoro-1,3-Butadiene
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Etching Method
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Magnetic Sensor and Method of Manufacturing Magnetic Sensor
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Deposition Apparatus Having Particular Arrangement of Raw Material Supply Port, Partition Plate, and Opening for Measuring a Temperature
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Production Method of Aliphatic Carboxylic Acid Ester
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Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
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Method for Producing Inositol Derivative
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Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
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Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Media, and Magnetic Recording Medium
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Method of Manufacturing Magnetic Sensor and Magnetic Sensor Assembly
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Method for Producing Alumina Sintered Body
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Hexagonal Boron Nitride Powder and Method for Producing the Same, and Composition and Heat Dissipation Material Using the Same
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Polymer Design Device, Polymer Design Method, and Non-Transitory Recording Medium
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Method of Manufacturing Sic Epitaxial Wafer
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SiC SINGLE CRYSTAL MANUFACTURING APPARATUS AND SiC SINGLE CRYSTAL MANUFACTURING METHOD
Application: 16/681,328 →
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SiC EPITAXIAL GROWTH APPARATUS HAVING PURGE GAS SUPPLY PORTS WHICH SURROUND A VICINITY OF A RAW MATERIAL GAS SUPPLY PORT
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Publication: US US20200173053A1
SiC CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING SiC EPITAXIAL WAFER
Application: 16/699,360 →
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Crystal Growing Apparatus and Crucible Having a Main Body Portion and a Low Radiation Portion
Application: 16/702,749 →
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Crystal Growing Apparatus and Crucible Having a Main Body Portion and a First Portion Having a Radiation Rate Different from That of the Main Body Portion
Application: 16/702,905 →
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SiC SINGLE CRYSTAL MANUFACTURING APPARATUS AND STRUCTURE HAVING CONTAINER AND FILLER FOR MANUFACTURING SiC SINGLE CRYSTAL
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Method of Manufacturing Tantalum Carbide Material
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Gel Composition
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Etching Method and Semiconductor Manufacturing Method
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Alumina Sintered Body, Abrasive Grain, and Grinding Wheel
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Fluorine-Containing Ether Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
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Process for Producing 1,2,3,4-Tetrachlorobutane
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Magnetic Sensor, Measuring Device and Method of Manufacturing Magnetic Sensor
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Method and Apparatus for Producing Fluorine-Containing Organic Compound
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Production Method and Production Apparatus of Continuously Cast Metal Rod
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Production Method and Production Apparatus of Continuously Cast Metal Rod
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Melanin Production Inhibitor, Whitening Agent, Fibroblast Activator, Collagen and/or Elastin Production Promotor and Wrinkle Ameliorant
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High Density Magnetic Recording Medium for Heat-Assisted Magnetic Storage Apparatus
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Sic Substrate Evaluation Method and Method for Manufacturing Sic Epitaxial Wafer
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Epitaxial Silicon Carbide Single Crystal Wafer and Process for Producing the Same
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Single Crystal Growth Crucible Having a First Housing and a Second Housing, and Single Crystal Production Device
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Magnetic Recording Medium Having Magnetic Layer with Nitride of Carbon or Hydride of Carbon, and Magnetic Storage Apparatus
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Glass-Coated Aluminum Nitride Particles, Method for Producing Same, and Heat Dissipating Resin Composition Containing Same
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Method for Producing Tetrafluoromethane
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Method for Producing Tetrafluoromethane
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Method for Producing Tetrafluoromethane
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Fullerene Compound, Lubricant for Magnetic Recording Medium, and Magnetic Recording Medium
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Method and Apparatus for Producing 1,2,3,4-Tetrachlorobutane
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Method of Manufacturing Solid Electrolytic Capacitor, and Method of Manufacturing Dispersion Containing Conjugated Electrically Conductive Polymer
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Method for Producing Hexafluoro-1,3-Butadiene
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Method of Producing N,N-Disubstituted Amide and Catalyst for Producing N,N-Disubstituted Amide
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Crystal Growth Apparatus Including Heater with Multiple Regions and Crystal Growth Method Therefor
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Storage Apparatus
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Storage Apparatus
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Magnetic Recording Medium and Magnetic Storage Device
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Magnetic Recording Medium Utilizing Adjacent Underlayer and Magnetic Layer Having Particular Compositions, Magnetic Storage Apparatus, and Method of Manufacturing Magnetic Recording Medium
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Composition, Production Method for Composition, and Production Method for Unsaturated Compound
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Silicon-Containing Oxide-Coated Aluminum Nitride Particle and Method of Manufacturing the Same
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Chloroprene Copolymer Latex Composition and Molded Product Thereof
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Method for Producing Orotic Acid Derivative
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Storage Apparatus
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Magnetic Recording Medium and Magnetic Storage Apparatus
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Cubic Boron Nitride Sintered Body and Manufacturing Method Thereof, and Tool
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Fin for Heat Exchanger
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Related Assignments (22)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 9, 2020
From: YONEDA, SHUHEI; SAKAGUCHI, SUGURU; SATO, TAKASHI; OKUNO, YOSHISHIGE
To: SHOWA DENKO K.K.
Reel/Frame 054020/0207 →
Assignment of Assignor's Interest May 3, 2021
From: ENDO, DAIZO; SHINO, TATSUNORI; OHASHI, HARUHISA
To: SHOWA DENKO K.K.
Reel/Frame 056112/0407 →
Assignment of Assignor's Interest Jun 10, 2021
From: SHINO, TATSUNORI; ENDO, DAIZO
To: SHOWA DENKO K.K.
Reel/Frame 056499/0855 →
Assignment of Assignor's Interest Jul 14, 2021
From: SHINO, TATSUNORI
To: SHOWA DENKO K.K.
Reel/Frame 056852/0804 →
Assignment of Assignor's Interest Aug 17, 2021
From: YAMAKI, SHIGERU; YONEDA, SHUHEI; TOBA, MASAHIKO
To: SHOWA DENKO K.K.
Reel/Frame 057203/0718 →
Assignment of Assignor's Interest Oct 14, 2021
From: TONEGAWA, SHO; SAKAWAKI, AKIRA; WATANABE, YASUMASA; ENDO, DAIZO
To: SHOWA DENKO K.K.
Reel/Frame 057794/0390 →
Assignment of Assignor's Interest Nov 9, 2021
From: SHINO, TATSUNORI
To: SHOWA DENKO K.K.
Reel/Frame 058059/0760 →
Assignment of Assignor's Interest Nov 15, 2021
From: ENDO, DAIZO; SAKAWAKI, AKIRA
To: SHOWA DENKO K.K.
Reel/Frame 058111/0483 →
Assignment of Assignor's Interest Dec 2, 2021
From: YAMAKI, SHIGERU; YONEDA, SHUHEI
To: SHOWA DENKO K.K.
Reel/Frame 058275/0062 →
Assignment of Assignor's Interest Dec 2, 2021
From: YAMAKI, SHIGERU
To: SHOWA DENKO K.K.
Reel/Frame 058273/0680 →
Assignment of Assignor's Interest Dec 2, 2021
From: ENDO, DAIZO; TOMITA, HIROYUKI
To: SHOWA DENKO K.K.
Reel/Frame 058296/0900 →
Assignment of Assignor's Interest Dec 2, 2021
From: SHINO, TATSUNORI
To: SHOWA DENKO K.K.
Reel/Frame 058296/0942 →
Assignment of Assignor's Interest Dec 3, 2021
From: YAMAKI, SHIGERU; YONEDA, SHUHEI
To: SHOWA DENKO K.K.
Reel/Frame 058276/0979 →
Assignment of Assignor's Interest Dec 6, 2021
From: ENDO, DAIZO; SHINO, TATSUNORI; SAKAWAKI, AKIRA; TONEGAWA, SHO
To: SHOWA DENKO K.K.
Reel/Frame 058305/0958 →
Assignment of Assignor's Interest Jan 28, 2022
From: TONEGAWA, SHO; SAKAWAKI, AKIRA; ENDO, DAIZO; HASEGAWA, KOTA
To: SHOWA DENKO K. K.
Reel/Frame 058902/0231 →
Assignment of Assignor's Interest Feb 1, 2022
From: TONEGAWA, SHO; SAKAWAKI, AKIRA; ENDO, DAIZO; HASEGAWA, KOTA
To: SHOWA DENKO K. K.
Reel/Frame 058841/0558 →
Assignment of Assignor's Interest Feb 1, 2022
From: TONEGAWA, SHO; SAKAWAKI, AKIRA; ENDO, DAIZO; HASEGAWA, KOTA
To: SHOWA DENKO K.K.
Reel/Frame 058841/0444 →
Assignment of Assignor's Interest Mar 7, 2022
From: TOMITA, HIROYUKI; KABE, ISAO
To: SHOWA DENKO K.K.
Reel/Frame 059187/0563 →
Assignment of Assignor's Interest Mar 24, 2022
From: YAMAKI, SHIGERU; YONEDA, SHUHEI
To: SHOWA DENKO K.K.
Reel/Frame 059384/0757 →
Assignment of Assignor's Interest Apr 18, 2022
From: YAMAKI, SHIGERU; YONEDA, SHUHEI
To: SHOWA DENKO K. K.
Reel/Frame 059627/0181 →
Change of Address Feb 9, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066547/0677 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →