IP Library Granted Patent US 7,959,492
Granted Patent B2
US 7,959,492 · App. 11/898,273 · Granted Jun 14, 2011

Disk-shaped substrate inner circumference polishing method

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Quick Facts
Patent No.
US 7,959,492
App. No.
11/898,273
Granted
Jun 14, 2011
Kind
B2
Abstract

The disk-shaped substrate inner circumference polishing method for polishing an inner circumference of a disk-shaped substrate including a portion having an opening hole at the center thereof includes inserting a brush having a shaft core into the portion having the opening hole of the disk-shaped substrate; fixing one end and the other end of the brush to a pair of rotating shafts that are provided at mutually detached positions and pulling at least any one of the one end and the other end of the brush and applying tension in the axial direction to the shaft core of the brush; and rotating the brush and polishing the inner circumference of the disk-shaped substrate.

Claims (24)

1. A disk-shaped substrate inner circumference polishing method for polishing an inner circumference of a disk-shaped substrate including a portion having an opening hole at the center thereof, comprising:

inserting a brush having a shaft core into the portion having the opening hole of the disk-shaped substrate, wherein the shaft core of the brush is formed by twisting wires;

fixing one end of the brush to a first rotating shaft and the other end of the brush to a second rotating shaft, with each shaft being provided at a mutually detached position and pulling at least any one of the one end and the other end of the brush and applying tension in an axial direction to the shaft core of the brush, and wherein both shafts are positively driven;

synchronously rotating the rotating shafts by positively driving the rotating shafts by a mechanical connection of the rotating shafts with a single motor, or by controlling individual motors provided to each rotating shaft;

rotating the brush and polishing the inner circumference of the disk-shaped substrate;

pulling the brush out from the disk-shaped substrate;

inserting a second brush of which bristles are shorter and harder than the bristles of the brush into the portion having the opening hole of the disk-shaped substrate;

fixing one end of the second brush to one of the rotating shafts and the other end of the second brush to the other rotating shaft, pulling at least any one of the one end and the other end of the second brush, and applying tension in the axial direction to a shaft core of the second brush; and

rotating at least any one of the second brush and the disk-shaped substrate, and polishing the inner circumference of the disk-shaped substrate.

2. The disk-shaped substrate inner circumference polishing method according to claim 1 , wherein

the brush inserted into the portion having the opening hole has bristles that are arranged spirally, and

the shaft core of the brush has flexibility.

3. The disk-shaped substrate inner circumference polishing method according to claim 1 , wherein the shaft core of the second brush is formed by twisting wires.

4. The disk-shaped substrate inner circumference polishing method according to claim 1 , comprising:

attaching a plurality of the disk-shaped substrates to a substrate holder to which the plurality of the disk-shaped substrates are attached in the axial direction;

inserting the brush into the portions having the opening hole of the disk-shaped substrates attached to the substrate holder;

fixing one end of the brush to one of the rotating shafts and the other end of the brush to the other rotating shaft, with each shaft being provided at a mutually detached position in a horizontal direction, and

soaking by submerging in a liquid a part of the disk-shaped substrates attached to the substrate holder into polishing liquid and polishing the inner circumference of the disk-shaped substrates.

5. The disk-shaped substrate inner circumference polishing method according to claim 4 , wherein the rotating shafts to which the brush is fixed are provided in a position away from a liquid bath for soaking the part of the substrate holder into a polishing liquid.

6. The disk-shaped substrate inner circumference polishing method according to claim 1 , comprising:

attaching a plurality of the disk-shaped substrates to a substrate holder to which the plurality of the disk-shaped substrates are attached in an axial direction;

holding the substrate holder in a horizontal state;

soaking a part of the disk-shaped substrates in polishing liquid; and

polishing the inner circumference of the disk-shaped substrates.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 15, 2024
From: RESONAC CORPORATION
To: RESONAC HARD DISK CORPORATION
Reel/Frame 069167/0673 →
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 8, 2012
From: CITIZEN SEIMITSU CO., LTD.
To: SHOWA DENKO K.K.
Reel/Frame 028347/0110 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 11, 2007
From: HANEDA, KAZUYUKI; WATANABE, KUNIZO; SATO, YOSUKE
To: SHOWA DENKO K.K.; CITIZEN SEIMITSU CO., LTD.
Reel/Frame 019853/0367 →