IP Library Granted Patent US 11,781,092
Granted Patent B2
US 11,781,092 · App. 17/634,625 · Granted Oct 10, 2023

Composition, and method for cleaning adhesive polymer

Inventor: Kotaro Hayashi (Tokyo, JP)
Assignee: Resonac Corporation
C11D7/5013B08B3/08C11D3/2068C11D3/28C11D7/263C11D7/28C11D7/32C11D7/3209C11D7/3281C11D7/5022
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Quick Facts
Patent No.
US 11,781,092
App. No.
17/634,625
Granted
Oct 10, 2023
Kind
B2
Abstract

Provided is a composition which has an excellent affinity with the surface of an adhesive agent and can achieve a high etching rate. The composition according to one embodiment comprises: a quaternary alkylammonium fluoride or a hydrate of a quaternary alkylammonium fluoride; and, as an aprotic solvent, (A) an N-substituted amide compound having no active hydrogen on a nitrogen atom, and (B) a dipropylene glycol dimethyl ether, wherein (B) the dipropylene glycol dimethyl ether has the percentage of a structural isomer represented by formula (1) of at least 50 mass % with respect to the total amount of (B) the dipropylene glycol dimethyl ether.

Claims (16)

1. A composition comprising a quaternary alkylammonium fluoride or a hydrate of a quaternary alkylammonium fluoride; and as an aprotic solvent, (A) an N-substituted amide compound having no active hydrogen on a nitrogen atom, and (B) dipropylene glycol dimethyl ether, wherein the proportion of the structural isomer represented by the formula (1):

in (B) dipropylene glycol dimethyl ether is 50% by mass or more with respect to the total amount of (B) dipropylene glycol dimethyl ether.

2. The composition according to claim 1 , wherein the proportion of the structural isomer represented by the formula (1) is 60% by mass or more with respect to the total amount of (B) dipropylene glycol dimethyl ether.

3. The composition according to claim 1 , wherein the (A) N-substituted amide compound is a 2-pyrrolidone derivative compound represented by the formula (2):

wherein, in the formula (2), R 1 represents an alkyl group having 1 to 4 carbon atoms.

4. The composition according to claim 3 , wherein the (A) N-substituted amide compound is a 2-pyrrolidone derivative compound wherein R 1 in the formula (2) is a methyl group or an ethyl group.

5. The composition according to claim 1 , wherein the content of the quaternary alkylammonium fluoride in the composition is 0.01 to 10% by mass.

6. The composition according to claim 1 , wherein the quaternary alkylammonium fluoride is a tetraalkylammonium fluoride represented by R 2 R 3 R 4 R 5 N + F − , wherein R 2 to R 5 are each independently an alkyl group selected from the group consisting of a methyl group, an ethyl group, an n-propyl group, an isopropyl group, and an n-butyl group.

7. The composition according to claim 1 , wherein the content of the (A) N-substituted amide compound is 50 to 95% by mass and the content of (B) dipropylene glycol dimethyl ether is 5 to 50% by mass, with respect to 100% by mass of the aprotic solvent.

8. The composition according to claim 1 , which is a decomposing cleaning composition for an adhesive polymer.

9. The composition according to claim 8 , wherein the adhesive polymer is a polyorganosiloxane compound.

10. A method for cleaning an adhesive polymer on a substrate by using the composition according to claim 1 .

11. The composition according to claim 1 , wherein the proportion of the structural isomer represented by the formula (1) is 60 to 95% by mass with respect to the total amount of (B) dipropylene glycol dimethyl ether.

12. The composition according to claim 1 , wherein the proportion of the structural isomer represented by the formula (1) is 70 to 95% by mass with respect to the total amount of (B) dipropylene glycol dimethyl ether.

13. The composition according to claim 1 , wherein the content of a protic solvent in the composition is 5% by mass or less.

14. The composition according to claim 1 , wherein the content of a protic solvent in the composition is 3% by mass or less.

Assignments (3)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 11, 2022
From: HAYASHI, KOTARO
To: SHOWA DENKO K.K.
Reel/Frame 058988/0590 →
Cited By (1)
US 12,577,508