IP Library Granted Patent US 11,136,298
Granted Patent B2
US 11,136,298 · App. 16/680,570 · Granted Oct 5, 2021

Method for producing fullerene derivative

Inventors: Tienan Jin (Sendai, JP); Weili Si (Boulder, CO); Yoshinori Yamamoto (Sendai, JP); Takeshi Igarashi (Chiba, JP)
Assignees: SHOWA DENKO K.K.; MITSUBISHI CORPORATION
C07D241/38A61K31/5377A61K31/55C01B32/154C07C1/26C07C2/86C07C13/64C07C17/266C07C17/32C07C25/22C07C41/30C07C43/21C07C67/343C07C69/76C07D241/36C07D241/42C07D333/78C07B61/00C07C2523/06C07C2523/34C07C2523/745C07C2604/00
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Quick Facts
Patent No.
US 11,136,298
App. No.
16/680,570
Granted
Oct 5, 2021
Kind
B2
Abstract

This method for producing a fullerene derivative is a method for producing a fullerene derivative having a partial structure shown by formula (1) by reacting a predetermined halogenated compound and two carbon atoms adjacent to each other for forming a fullerene skeleton in a mixed solvent of an aromatic solvent and an aprotic polar solvent having a C═O or S═O bond in the presence of at least one metal selected from the group comprising manganese, iron, and zinc; (in formula (1), C* are each carbon atoms adjacent to each other for forming a fullerene skeleton, A is a linking group having 1-4 carbon atoms for forming a ring structure with two C*, in which a portion thereof may be a substituted or condensed group).

Claims (1)

1. A halogenated compound being a 5,5-dibromo-5-phenylvaleric acid methyl ester.

Assignments (4)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
PARTIAL ASSIGNMENT Recorded Apr 23, 2021
From: SHOWA DENKO K.K.
To: MITSUBISHI CORPORATION
Reel/Frame 056030/0611 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 12, 2019
From: JIN, TIENAN; SI, WEILI; YAMAMOTO, YOSHINORI; IGARASHI, TAKESHI
To: SHOWA DENKO K.K.
Reel/Frame 050989/0464 →