IP Library Granted Patent US 11,891,472
Granted Patent B2
US 11,891,472 · App. 17/269,147 · Granted Feb 6, 2024

Composition, production method for composition, and production method for unsaturated compound

Inventors: Norihito Nishimura (Kawasaki, JP); Katsutoshi Ohno (Aizuwakamatsu, JP)
Assignee: RESONAC CORPORATION
C08G18/8116C08G18/10C08G18/286C08G18/288C08G18/4833C08G18/807
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Quick Facts
Patent No.
US 11,891,472
App. No.
17/269,147
Granted
Feb 6, 2024
Kind
B2
Abstract

The composition comprises a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), and comprises 0.00002 to 2.0 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A), (R 1 —COO) n —R 2 —(NCO) m   (1) (R 1 —COO) n —R 2 —NHC(═O)NH—R 2 —(OCO—R 1 ) m   (2) wherein in general formulae (1) and (2), R 1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R 2 is a (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally contain an ether group; R 1 and R 2 in the general formula (1) are the same as R 1 and R 2 in the general formula (2); and n and m each represent an integer of one or two.

Claims (22)

1. A composition comprising:

a compound (A) represented by general formula (1) and

a compound (B) represented by general formula (2),

wherein the composition comprises 0.00002 to 2.0 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A),

(R 1 —COO) n —R 2 —(NCO) m   (1)

(R 1 —COO) n —R 2 —NHC(═O)NH—R 2 —(OCO—R 1 ) m   (2)

wherein in the general formulae (1) and (2),

R 1 is an ethylenically unsaturated group having 2 to 7 carbon atoms;

R 2 is a (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally comprises an ether group;

R 1 and R 2 in the general formula (1) are the same as R 1 and R 2 in the general formula (2); and

n and m each represent an integer of 1 or 2.

2. The composition according to claim 1 , wherein the compound (A) is at least one compound selected from the group consisting of 2-methacryloyloxyethyl isocyanate, 2-(isocyanatoethyloxy) ethyl methacrylate, 2-acryloyloxyethyl isocyanate, 2-(isocyanatoethyloxy) ethyl acrylate, and 1,1-bis(acryloyloxymethyl)ethyl isocyanate.

3. The composition according to claim 1 , wherein a content of the compound (A) in the composition is 95.0% by mass or more.

4. The composition according to claim 1 , wherein the content of the compound (A) in the composition is 97.0% by mass to 99.9% by mass.

5. The composition according to claim 1 , further comprising as an additive any one selected from the group consisting of hydroquinone, methoxyhydroquinone, catechol, p-tert-butylcatechol, cresol, 2,6-di-tert-butyl-4-methylphenol (BHT), and phenothiazine.

6. A method of producing an unsaturated compound, comprising the steps of:

mixing the composition according to claim 1 with a compound having active hydrogen; and

reacting the compound (A) contained in the composition with the compound having active hydrogen to obtain a reaction product.

7. The method of producing an unsaturated compound according to claim 6 , wherein the compound having the active hydrogen is an alcohol, a thiol, an amine or a carboxylic acid.

8. The method of producing an unsaturated compound according to claim 6 , wherein the reaction product is an unsaturated urethane compound, an unsaturated thiourethane compound, an unsaturated urea compound, or an unsaturated amide compound.

9. The method of producing an unsaturated compound according to claim 6 , wherein the reaction product is any one selected from the group consisting of 2-butanone oxime-O-(carbamoylethyl-2-methacrylate), 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl methacrylate, 2-butanone oxime-O-(carbamoylethyl-2-acrylate), and 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl acrylate.

10. The method of producing an unsaturated compound according to claim 6 , wherein a reaction temperature at which the compound (A) contained in the composition is reacted with the compound having the active hydrogen is −10 to 100° C.

Assignments (3)
CHANGE OF ADDRESS Recorded Feb 9, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066547/0677 →
CHANGE OF NAME Recorded Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 17, 2021
From: NISHIMURA, NORIHITO; OHNO, KATSUTOSHI
To: SHOWA DENKO K.K.
Reel/Frame 055298/0385 →