Method for producing SiC single crystal, SiC single crystal, and SiC ingot
This method for producing a SiC single crystal includes a first growth step of growing a crystal from a seed crystal in a direction that is substantially orthogonal to the <0001> direction, a second growth step of growing the crystal in a direction that is substantially orthogonal to the <0001> direction and substantially orthogonal to the direction of crystal growth in the first growth step, a third growth step of growing the crystal along the direction of crystal growth in the first growth step but in the opposite orientation to the orientation of crystal growth in the first growth step, and a fourth growth step of growing the crystal along the direction of crystal growth in the second growth step but in the opposite orientation to the orientation of crystal growth in the second growth step.
1. A method for producing a SiC single crystal, comprising:
a first growth step of growing a crystal from a seed crystal in a <1-100> direction or a <11-20> direction;
a second growth step of growing the crystal in a direction among the <1-100> direction and the <11-20> direction in which crystal growth was not performed in the first growth step;
a third growth step of growing the crystal along the direction of crystal growth in the first growth step but in an opposite orientation to an orientation of crystal growth in the first growth step; and
a fourth growth step of growing the crystal along the direction of crystal growth in the second growth step but in an opposite orientation to an orientation of crystal growth in the second growth step,
wherein an amount of growth of the single crystal in the third growth step relative to an amount of growth of the single crystal in the first growth step is within a range from 0.9 times to 1.1 times.
2. The method for producing a SiC single crystal according to claim 1 , wherein each of the first growth step, the second growth step, the third growth step and the fourth growth step is divided into a plurality of stages.
3. The method for producing a SiC single crystal according to claim 1 , wherein the first growth step, the second growth step, the third growth step and the fourth growth step represent one set, and the set is performed at least once.
4. The method for producing a SiC single crystal according to claim 3 , wherein in the set of growth steps, the growth steps are performed in a sequence composed of the first growth step, the second growth step, the third growth step, and then the fourth growth step.
5. The method for producing a SiC single crystal according to claim 3 , wherein in the set of growth steps, the growth steps are performed in a sequence composed of the first growth step, the third growth step, the second growth step, and then the fourth growth step.
6. The method for producing a SiC single crystal according to claim 1 , wherein an amount of growth of the single crystal in the fourth growth step relative to an amount of growth of the single crystal in the second growth step is within a range from 0.9 times to 1.1 times.
7. The method for producing a SiC single crystal according to claim 1 , wherein a length of crystal growth from the seed crystal in each orientation is from 0.5 times to 5 times a thickness of the seed crystal.
8. The method for producing a SiC single crystal according to claim 1 , wherein in each of the first growth step, the second growth step, the third growth step and the fourth growth step, the SiC single crystal obtained following each growth step has a length along a long direction that is not more than 10 times a length along a short direction.