Single-crystal silicon carbide ingot, and substrate and epitaxial wafer obtained therefrom
View Patent ↗The present invention provides a single-crystal silicon carbide ingot capable of providing a good-quality substrate low in dislocation defects, and a substrate and epitaxial wafer obtained therefrom. It is a single-crystal silicon carbide ingot comprising single-crystal silicon carbide which contains donor-type impurity at a concentration of 2×10 18 cm −3 to 6×10 20 cm −3 and acceptor-type impurity at a concentration of 1×10 18 cm −3 to 5.99×10 20 cm −3 and wherein the concentration of the donor-type impurity is greater than the concentration of the acceptor-type impurity and the difference is 1×10 18 cm −3 to 5.99×10 20 cm −3 , and a substrate and epitaxial wafer obtained therefrom.
1. A single-crystal silicon carbide ingot comprising single-crystal silicon carbide which contains donor-type impurity at a concentration of 2×10 18 cm −3 to 6×10 20 cm −3 and acceptor-type impurity at a concentration of 1×10 18 cm −3 to 1.5×10 19 cm −3 and wherein the concentration of the donor-type impurity is greater than the concentration of the acceptor-type impurity and the difference is 1×10 18 cm −3 to 5.99×10 20 cm −3 , said single-crystal silicon carbide ingot characterized in that the etch pit density caused by basal plane dislocations measured on a single-crystal silicon carbide substrate cut from the ingot at an off-angle of 8° from the (0001) Si plane and polished is 1×10 4 cm −2 or less.
2. A single-crystal silicon carbide ingot according to claim 1 , wherein the difference between the donor-type impurity concentration and the acceptor-type impurity concentration is 6×10 18 cm −3 to 5.99×10 20 cm −3 .
3. A single-crystal silicon carbide ingot according to claim 1 , wherein the crystal polytype of the single-crystal silicon carbide is 4H.
4. A single-crystal silicon carbide ingot according to claim 1 , wherein the donor-type impurity is nitrogen.
5. A single-crystal silicon carbide ingot according to claim 1 , wherein the acceptor-type impurity is boron.
6. A single-crystal silicon carbide ingot according to claim 1 , wherein the acceptor-type impurity is aluminum.
7. A single-crystal silicon carbide ingot according to claim 1 , wherein the diameter of the ingot is 50 mm to 300 mm.
8. A single-crystal silicon carbide ingot according to claim 1 , wherein the etch pit density caused by basal plane dislocations measured on a single-crystal silicon carbide substrate cut from the ingot at an off-angle of 8° from the (0001) Si plane and polished is 5×10 3 cm −2 less.
9. A single-crystal silicon carbide substrate cut from a single-crystal silicon carbide ingot according to any of claims 1 to 7 and polished.
10. A silicon carbide epitaxial wafer obtained by epitaxially growing a silicon carbide film on the single-crystal silicon carbide substrate of claim 9 .
11. A silicon carbide epitaxial wafer obtained by epitaxially growing gallium nitride, aluminum nitride, indium nitride or a mixed crystal thereof on the single-crystal silicon carbide substrate of claim 9 .