Method for forming carbon protective film and method for producing magnetic recording medium, magnetic recording medium and magnetic recording/reproducing apparatus
View Patent ↗The present invention provides a method for forming a carbon protective film and a method for producing a magnetic recording medium, that decreases the generation of particles in a plasma CVD apparatus thereby improving flatness of the surface of a carbon protective film, and also can manufacture a magnetic recording medium having high recording density and excellent recording/reproducing characteristics; a magnetic recording medium; and a magnetic recording/reproducing apparatus using the magnetic recording medium.
1. A method for forming a carbon protective film in which a disk-shaped substrate with a magnetic film formed thereon is arranged and electrodes are arranged in spaced opposed relation to each other on both surfaces of the substrate in a film formation chamber, and then plasma is generated between the electrodes and the substrate in a carbon-containing gas thereby forming a carbon protective film on both surfaces of the substrate through a chemical vapor deposition (CVD) method, the method comprising:
using, as the electrodes, electrodes whose surfaces have been subjected to a roughening treatment,
a film formation step of forming a carbon protective film on the substrate in a state where the substrate is arranged in the film formation chamber, and a removing step of removing a carbon film accumulated on the surfaces of the electrodes through ashing in a state where the substrate is not arranged in the film formation chamber, and
repeating the film formation step and the removing step in this sequence.
2. The method for forming a carbon protective film according to claim 1 , wherein the film formation step and the removing step are repeated in this sequence, and
the removing step is performed after repeating the film formation step multiple times.
3. The method for forming a carbon protective film according to claim 1 , wherein the film formation step and the removing step are repeated in this sequence, and
a coating step of forming a carbon film on the surfaces of the electrodes in a state where the substrate is not arranged in the film formation chamber is further provided between the removing step and the subsequent film formation step.
4. The method for forming a carbon protective film according to claim 2 , wherein the film formation step and the removing step are repeated in this sequence, and
a coating step of forming a carbon film on the surfaces of the electrodes in a state where the substrate is not arranged in the film formation chamber is further provided between the removing step and the subsequent film formation step.