Method of manufacturing magnetic recording medium and magnetic recording/reproducing device
View Patent ↗Provided is a method of manufacturing a magnetic recording medium capable of manufacturing at a high productivity a useful magnetic recording medium having high surface smoothness and excellent head floating characteristics. Such a method of manufacturing a magnetic recording medium includes: forming a magnetic layer on a nonmagnetic substrate; and partially injecting ions into the magnetic layer to modify magnetic characteristics at a location of the magnetic layer where the ions are injected and to form magnetically separated magnetic recording patterns, in which, when partially injecting ions into the magnetic layer, a carbon film is formed on the surface of the magnetic layer, the carbon film is partially thinned by patterning, and ions are partially injected into the magnetic layer through locations where the carbon film is thinned.
1. A method of manufacturing a magnetic recording medium, the method comprising:
forming a magnetic layer, which has a substantially flat surface, on a nonmagnetic substrate;
forming a carbon film on the surface of the magnetic layer;
performing patterning of the carbon film to partially reduce the thickness of the carbon film and form locations where the carbon is thinned; and
partially injecting ions into the magnetic layer through the locations, where the carbon film has been thinned, to modify magnetic characteristics of locations of the magnetic layer by the injection of the ions and obtain magnetically separated magnetic recording patterns in the magnetic layer.
2. The method according to claim 1 ,
wherein the magnetic characteristics are modified by nonmagnetization or amorphization of the magnetic layer.
3. The method according to claim 1 ,
wherein the thickness of the locations where the carbon film is partially thinned is in a range of 5 to 10 nm.
4. The method according to claim 1 ,
wherein, when patterning the carbon film, resist is coated on the surface of the carbon film, a stamp whose surface has a concavo-convex shape is used to transfer the concavo-convex shape to the surface of the resist, and the concave portion of the resist and the underlying carbon film are etched.
5. The method according to claim 4 ,
wherein, after the ions are partially injected into the magnetic layer, the resist and the carbon film are removed.
6. The method according to claim 1 ,
wherein the ions to be injected are ions including one or more atoms selected from a group consisting of N, O, Ar, and Ne.
7. The method according to claim 2 ,
wherein the thickness of the locations where the carbon film is partially thinned is in a range of 5 to 10 nm.
8. The method according to claim 2 ,
wherein, when patterning the carbon film, resist is coated on the surface of the carbon film, a stamp whose surface has a concavo-convex shape is used to transfer the concavo-convex shape to the surface of the resist, and the concave portion of the resist and the underlying carbon film are etched.
9. The method according to claim 3 ,
wherein, when patterning the carbon film, resist is coated on the surface of the carbon film, a stamp whose surface has a concavo-convex shape is used to transfer the concavo-convex shape to the surface of the resist, and the concave portion of the resist and the underlying carbon film are etched.
10. The method according to claim 7 ,
wherein, when patterning the carbon film, resist is coated on the surface of the carbon film, a stamp whose surface has a concavo-convex shape is used to transfer the concavo-convex shape to the surface of the resist, and the concave portion of the resist and the underlying carbon film are etched.
11. The method according to claim 8 ,
wherein, after the ions are partially injected into the magnetic layer, the resist and the carbon film are removed.
12. The method according to claim 2 ,
wherein the ions to be injected are ions including one or more atoms selected from a group consisting of N, O, Ar, and Ne.
13. The method according to claim 3 ,
wherein the ions to be injected are ions including one or more atoms selected from a group consisting of N, O, Ar, and Ne.