Gas treatment method and gas treatment device
Provided are a gas treatment method and a gas treatment device capable of efficiently removing a bromofluoroethylene. A gas containing a bromofluoroethylene is brought into contact with an adsorbent ( 7 ) having pores with an average pore diameter of 0.4 nm or more and 4 nm or less in a temperature environment of not less than 0° C. and less than 120° C. to allow the adsorbent ( 7 ) to adsorb the bromofluoroethylene, and thus the bromofluoroethylene is separated from the gas.
1. A gas treatment method comprising:
bringing a gas containing a bromofluoroethylene into contact with an adsorbent having pores with an average pore diameter of 0.4 nm or more and 4 nm or less in a temperature environment of not less than 0° C. and less than 120° C. to allow the adsorbent to adsorb the bromofluoroethylene, and
separating the bromofluoroethylene from the gas.
2. The gas treatment method according to claim 1 , wherein the bromofluoroethylene is at least one of bromotrifluoroethylene, 1-bromo-2,2-difluoroethylene, (E)-1-bromo-1,2-difluoroethylene, (Z)-1-bromo-1,2-difluoroethylene, 1-bromo-1-fluoroethylene, (E)-1-bromo-2-fluoroethylene, (Z)-1-bromo-2-fluoroethylene, 1,1-dibromo-2-fluoroethylene, (E)-1,2-dibromo-2-fluoroethylene, (Z)-1,2-dibromo-2-fluoroethylene, and tribromofluoroethylene.
3. The gas treatment method according to claim 1 , wherein the gas containing a bromofluoroethylene is a mixed gas of the bromofluoroethylene and an inert gas.
4. The gas treatment method according to claim 3 , wherein the inert gas is at least one of nitrogen gas, helium, argon, neon, and krypton.
5. The gas treatment method according to claim 1 , wherein the gas containing a bromofluoroethylene contains the bromofluoroethylene at a content of less than 25% by volume.
6. The gas treatment method according to claim 1 , wherein the adsorbent is at least one of zeolite and activated carbon.
7. The gas treatment method according to claim 1 , wherein the temperature environment is 0° C. or more and 100° C. or less.
8. The gas treatment method according to claim 1 , wherein the temperature environment is 0° C. or more and 70° C. or less.
9. The gas treatment method according to claim 1 , the method using a gas treatment device including an adsorption treatment container containing an adsorbent having pores with an average pore diameter of 0.4 nm or more and 4 nm or less, wherein
the adsorption treatment container includes an inlet through which a gas containing a bromofluoroethylene is fed and an outlet through which a treated gas after adsorption treatment of the gas containing a bromofluoroethylene with the adsorbent is discharged from an inside of the adsorption treatment container to an outside.
10. The gas treatment method according to claim 2 , wherein the gas containing a bromofluoroethylene is a mixed gas of the bromofluoroethylene and an inert gas.
11. The gas treatment method according to claim 2 , wherein the gas containing a bromofluoroethylene contains the bromofluoroethylene at a content of less than 25% by volume.
12. The gas treatment method according to claim 3 , wherein the gas containing a bromofluoroethylene contains the bromofluoroethylene at a content of less than 25% by volume.
13. The gas treatment method according to claim 4 , wherein the gas containing a bromofluoroethylene contains the bromofluoroethylene at a content of less than 25% by volume.
14. The gas treatment method according to claim 2 , wherein the adsorbent is at least one of zeolite and activated carbon.
15. The gas treatment method according to claim 3 , wherein the adsorbent is at least one of zeolite and activated carbon.
16. The gas treatment method according to claim 4 , wherein the adsorbent is at least one of zeolite and activated carbon.
17. The gas treatment method according to claim 5 , wherein the adsorbent is at least one of zeolite and activated carbon.
18. The gas treatment method according to claim 2 , wherein the temperature environment is 0° C. or more and 100° C. or less.
19. The gas treatment method according to claim 3 , wherein the temperature environment is 0° C. or more and 100° C. or less.
20. The gas treatment method according to claim 4 , wherein the temperature environment is 0° C. or more and 100° C. or less.