Microwave heating apparatus
View Patent ↗Provided is a microwave heating apparatus capable of effectively preventing the generation of sparks when an object containing a conductor (including a metal precursor such as a metal oxide) or a semiconductor is subjected to microwave heating. A microwave heating apparatus supplies a microwave so that the direction of the electrical flux line of the microwave is identical with the direction substantially parallel with a surface of a plate-like substrate and having thereon a pattern containing a conductor, a metal oxide, or a semiconductor, the substrate being arranged in the waveguide. The microwave heating apparatus also controls a pulse width of the microwave so that pulsed microwaves are supplied to the surface having the pattern thereon.
1. A microwave heating apparatus provided with:
a rectangular waveguide which is provided on one side, in the microwave travelling direction, with an iris unit, and on the other side with a movable short circuit unit;
a microwave supplying device which supplies a microwave so that the direction of the electrical flux line of the microwave is in parallel with a surface of a substrate, or the angle between the direction of the electrical flux line of the microwave and the surface of the substrate is maintained within 30 degrees, the substrate having thereon a pattern containing a conductor, a metal oxide, or a semiconductor, the substrate being arranged in the waveguide; and
a control device which controls a pulse width of the microwave supplying device so that pulsed microwaves are supplied to the surface having the pattern thereon.
2. The microwave heating apparatus according to claim 1 further comprising a substrate supplying device, wherein a plurality of waveguides are arranged in parallel with the traveling direction of the microwave, and juxtaposed in the direction perpendicular to the traveling direction of the microwave, so that the phases of the microwaves within the adjacent waveguides are maintained to be deviated 90 degrees, and the substrate supplying device supplies the substrate to pass through the plurality of waveguides sequentially.
3. The microwave heating apparatus according to claim 2 , wherein the microwave supplying directions are alternate between the adjacent waveguides in the plurality of waveguides.
4. The microwave heating apparatus according to claim 1 , wherein the pattern formed on the substrate has a thickness of 10 nm to 100 μm.
5. The microwave heating apparatus according to claim 4 , wherein the pattern has a thickness of 10 nm to 10 μm.