IP Library Granted Patent US 11,946,156
Granted Patent B2
US 11,946,156 · App. 16/734,966 · Granted Apr 2, 2024

SiC single crystal growth crucible, SiC single crystal manufacturing method, and SiC single crystal manufacturing apparatus

Inventor: Yohei Fujikawa (Hikone, JP)
Assignee: Resonac Corporation
C30B23/066C23C14/0635C23C14/243C30B29/36C30B35/002
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Quick Facts
Patent No.
US 11,946,156
App. No.
16/734,966
Granted
Apr 2, 2024
Kind
B2
Abstract

According to the invention, a SiC single crystal growth crucible includes: a raw material accommodation portion which accommodates a SiC raw material; and a seed crystal support portion which supports a seed crystal disposed on an upper portion of the raw material accommodation portion, in which the raw material accommodation portion has a tapered portion, an inner surface of which is tapered off downward.

Claims (22)

1. A SiC single crystal growth crucible comprising:

a raw material accommodation portion which accommodates a SiC raw material; and

a seed crystal support portion which supports a seed crystal disposed on an upper portion of the raw material accommodation portion,

wherein the raw material accommodation portion has a body portion on an upper side and a tapered portion on a lower side,

an inner surface of the body portion has a constant width,

an inner surface of the tapered portion is tapered off downward,

a bottom portion of the raw material accommodation portion is a bottom of the SiC single crystal growth crucible,

the tapered portion has a conical shape which is continuously and linearly tapered off, and

an outer surface of the tapered portion of the raw material accommodation portion is tapered off downward.

2. A SiC single crystal manufacturing apparatus comprising:

the SiC single crystal growth crucible according to claim 1 ; and

a heating device which heats the SiC single crystal growth crucible,

wherein the heating device is disposed such that a heating center is positioned in a range of the tapered portion of the raw material accommodation portion.

3. The SiC single crystal manufacturing apparatus according to claim 2 ,

wherein the heating center is a portion of an outer surface of the raw material accommodation portion where quantity of heat transmitted from the heating device is the greatest, and

a height of a taper start position of the tapered portion with respect to the heating center is 60 mm or less.

4. The SiC single crystal growth crucible according to claim 1 , wherein the raw material accommodation portion is made of graphite or tantalum carbide.

5. The SiC single crystal growth crucible according to claim 1 ,

wherein a side wall of the body portion is symmetrical with respect to a central axis of the raw material accommodation portion, and

a side wall of the tapered portion is symmetrical with respect to the central axis of the raw material accommodation portion.

6. The SiC single crystal growth crucible according to claim 1 ,

wherein the body portion and the tapered portion are continuum.

Assignments (3)
CHANGE OF ADDRESS Recorded Feb 9, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066547/0677 →
CHANGE OF NAME Recorded Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 6, 2020
From: FUJIKAWA, YOHEI
To: SHOWA DENKO K.K.
Reel/Frame 051486/0287 →