Method and supply equipment for supplying fluorine gas-containing gas
A method supply equipment for supplying a fluorine gas-containing gas which includes a sealing step of introducing a second fluorine gas-containing gas having a fluorine gas concentration in a range of ±10% of that of a first fluorine gas-containing gas into a portion between a container valve ( 3 ) and a pressure regulator ( 7 ) of a pipe ( 4 ) such that a pressure is lower than the gas pressure in a filled container ( 2 ). After the sealing step, a buffer tank ( 9 ) is brought into an opened state, and then the first fluorine gas-containing gas is supplied from the filled container ( 2 ) to the portion between the container valve ( 3 ) and the pressure regulator ( 7 ) of the pipe ( 4 ). Thereafter, the pressure regulator ( 7 ) is brought into an opened state, and then the first fluorine gas-containing gas is supplied to consumption equipment ( 20 ) while regulating a pressure by the pressure regulator ( 7 ).
1. A method for supplying a fluorine gas-containing gas from supply equipment for supplying the fluorine gas-containing gas to consumption equipment consuming the fluorine gas-containing gas,
the supply equipment including a filled container filled with a first fluorine gas-containing gas, a pipe letting a container valve of the filled container and the consumption equipment communicate with each other, a pressure regulator provided on the pipe and passing the gas from an upstream side to a downstream side while regulating a gas pressure, and a buffer tank connected to a portion on an upstream side relative to the pressure regulator of the pipe,
the method comprising:
performing a sealing step of bringing the pressure regulator into a closed state, and then introducing a second fluorine gas-containing gas having a fluorine gas concentration in a range of ±10% of a fluorine gas concentration of the first fluorine gas-containing gas into a portion between the container valve and the pressure regulator of the pipe such that a pressure is lower than the gas pressure in the filled container, and
after the sealing step, in a state where the second fluorine gas-containing gas is sealed in the portion between the container valve and the pressure regulator of the pipe and after the buffer tank is brought into an opened state, introducing the first fluorine gas-containing gas from the filled container into the portion between the container valve and the pressure regulator of the pipe, sending the second fluorine gas-containing gas sealed in the portion between the container valve and the pressure regulator of the pipe to the buffer tank, and then supplying the first fluorine gas-containing gas introduced into the portion between the container valve and the pressure regulator of the pipe to the consumption equipment.
2. The method for supplying a fluorine gas-containing gas according to claim 1 , wherein
the pressure of the second fluorine gas-containing gas is 45% or more and 54% or less of the gas pressure in the filled container.
3. The method for supplying a fluorine gas-containing gas according to claim 1 , wherein
as the second fluorine gas-containing gas, a fluorine gas-containing gas having same pressure and fluorine gas concentration as the pressure and the fluorine gas concentration of the first fluorine gas-containing gas is used.
4. The method for supplying a fluorine gas-containing gas according to claim 1 , wherein
a gate valve used in the supply equipment is a diaphragm valve.
5. The method for supplying a fluorine gas-containing gas according to claim 1 comprising:
before the sealing step, performing a purge treatment step of replacing the portion between the container valve and the pressure regulator of the pipe with an inert gas.
6. The method for supplying a fluorine gas-containing gas according to claim 1 , wherein
a material of a seat as a constituent component of the pressure regulator is a polychlorotrifluoroethylene resin.
7. The method for supplying a fluorine gas-containing gas according to claim 1 , wherein
the consumption equipment is a semiconductor manufacturing device.
8. The method for supplying a fluorine gas-containing gas according to claim 2 , wherein
a gate valve used in the supply equipment is a diaphragm valve.
9. The method for supplying a fluorine gas-containing gas according to claim 3 , wherein
a gate valve used in the supply equipment is a diaphragm valve.
10. The method for supplying a fluorine gas-containing gas according to claim 2 comprising:
before the sealing step, performing a purge treatment step of replacing the portion between the container valve and the pressure regulator of the pipe with an inert gas.
11. The method for supplying a fluorine gas-containing gas according to claim 3 comprising:
before the sealing step, performing a purge treatment step of replacing the portion between the container valve and the pressure regulator of the pipe with an inert gas.
12. The method for supplying a fluorine gas-containing gas according to claim 4 comprising:
before the sealing step, performing a purge treatment step of replacing the portion between the container valve and the pressure regulator of the pipe with an inert gas.
13. The method for supplying a fluorine gas-containing gas according to claim 2 , wherein
a material of a seat as a constituent component of the pressure regulator is a polychlorotrifluoroethylene resin.
14. The method for supplying a fluorine gas-containing gas according to claim 3 , wherein
a material of a seat as a constituent component of the pressure regulator is a polychlorotrifluoroethylene resin.
15. The method for supplying a fluorine gas-containing gas according to claim 4 , wherein
a material of a seat as a constituent component of the pressure regulator is a polychlorotrifluoroethylene resin.
16. The method for supplying a fluorine gas-containing gas according to claim 5 , wherein
a material of a seat as a constituent component of the pressure regulator is a polychlorotrifluoroethylene resin.
17. The method for supplying a fluorine gas-containing gas according to claim 2 , wherein
the consumption equipment is a semiconductor manufacturing device.
18. The method for supplying a fluorine gas-containing gas according to claim 3 , wherein
the consumption equipment is a semiconductor manufacturing device.
19. The method for supplying a fluorine gas-containing gas according to claim 4 , wherein
the consumption equipment is a semiconductor manufacturing device.