IP Library Granted Patent US 11,655,561
Granted Patent B2
US 11,655,561 · App. 16/553,302 · Granted May 23, 2023

n-Type 4H—SiC single crystal substrate and method of producing n-type 4H—SiC single crystal substrate

Inventors: Hiromasa Suo (Hikone, JP); Kazuma Eto (Tsukuba, JP); Tomohisa Kato (Tsukuba, JP)
Assignee: SHOWA DENKO K.K.
C30B29/36C01B32/956C30B23/066C01P2002/54C01P2006/40
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Quick Facts
Patent No.
US 11,655,561
App. No.
16/553,302
Granted
May 23, 2023
Kind
B2
Abstract

In an n-type 4H-SiC single crystal substrate of the present disclosure, the concentration of the element N as a donor and the concentration of the element B as an acceptor are both 3×10 18 /cm 3 or more, and a threading dislocation density is less than 4,000/cm 2 .

Claims (17)

1. An n-type 4H-SiC single crystal substrate in which a concentration of a donor element and a concentration of an acceptor element are both 3.0×10 18 /cm 3 or more, and a threading dislocation density is less than 4,000/cm 2 ,

wherein the threading dislocation includes threading screw dislocation, threading edge dislocation, and threading mixed dislocation.

2. The n-type 4H-SiC single crystal substrate according to claim 1 , wherein the concentration of the acceptor element is 3.0×10 18 /cm 3 or more and less than 2.0×10 19 /cm 3 .

3. The n-type 4H-SiC single crystal substrate according to claim 1 ,

wherein the acceptor element is boron (B).

4. The n-type 4H-SiC single crystal substrate according to claim 2 ,

wherein the acceptor element is boron (B).

5. The n-type 4H-SiC single crystal substrate according to claim 1 ,

wherein the donor element is nitrogen (N).

6. A method of producing an n-type 4H-SiC single crystal substrate according to claim 1 , comprising:

a process of filling a crucible with a raw material containing a silicon source (Si), a carbon source(C), and an element as an acceptor;

a process of pre-sublimating 0.1 mass% or more of the raw material in the crucible;

a process of disposing a seed crystal to face the raw material; and

a process of supplying a gas containing an element as a donor into the crucible, sublimating the pre-sublimated raw material in the crucible, and allowing a single crystal layer to grow on a surface of the seed crystal.

7. The method of producing an n-type 4H-SiC single crystal substrate according to claim 6 , wherein the acceptor is boron (B).

8. The method of producing an n-type 4H-SiC single crystal substrate according to claim 6 ,

wherein the donor is nitrogen (N).

Assignments (3)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 28, 2019
From: SUO, HIROMASA; ETO, KAZUMA; KATO, TOMOHISA
To: SHOWA DENKO K.K.
Reel/Frame 050198/0486 →
Priority Claims (1)
JP JP2018-161554 · Aug 30, 2018 · national
Continuity (1)
Related Publication 20200071849A1 · Mar 5, 2020
Cited By (1)
US 12,516,444