Crucible vessel and crucible cover having grooves for producing single-crystal silicon carbide, production apparatus and method
View Patent ↗The present invention, which provides a crucible for producing single-crystal silicon carbide, and a production apparatus and a production method for single-crystal silicon carbide, which are capable of stably growing a single-crystal silicon carbide ingot good in crystallinity at high yield, is a crucible for producing single-crystal silicon carbide having a crucible vessel for holding silicon carbide raw material and a crucible cover for attaching a seed crystal and is adapted to sublimate a silicon carbide raw material in the crucible vessel to supply silicon carbide sublimation gas onto a seed crystal attached to the crucible cover and grow single-crystal silicon carbide on the seed crystal, which crucible for producing single-crystal silicon carbide is provided in the crucible vessel and the crucible cover with threaded portions to be screwed together and is provided with a sublimation gas discharge groove or grooves capable of regulating flow rate by relative rotation of the threaded portions; and is a production apparatus for single-crystal silicon carbide equipped with such a crucible and a production method for single-crystal silicon carbide utilizing this apparatus.
1. A crucible for producing single-crystal silicon carbide, comprising:
a crucible vessel and a crucible cover, wherein
the crucible cover is configured for the attachment of a seed crystal to the crucible cover; and
the crucible vessel is configured to hold a silicon carbide raw material in the crucible vessel and sublimate the silicon carbide raw material to supply silicon carbide sublimation gas onto a seed crystal attached to the crucible cover, thereby growing single-crystal silicon carbide on the seed crystal, and wherein
the crucible vessel and the crucible cover each comprise threaded portions, configured to screw the crucible vessel and the crucible cover together, the threaded portion of the crucible vessel and/or the crucible cover comprising a sublimation gas discharge groove or grooves configured to regulate the sublimation gas flow rate by relative rotation of the threaded portions,
wherein the sublimation gas discharge groove or grooves in the threaded portion of the crucible vessel and/or crucible cover have an opening area, and comprise a groove outlet side and a groove inlet side, wherein the opening area changes from the groove outlet side to the groove inlet side.
2. The crucible for producing single-crystal silicon carbide as set out in claim 1 , wherein the sublimation gas discharge groove or grooves in the threaded portion of the crucible vessel and/or crucible cover open along the circumferential direction of the threaded portion, and the total length of the longest portion of the opening width of the sublimation gas discharge groove or grooves is not less than ¼ to not greater than 9/10 the threaded portion perimeter length.
3. A production apparatus for single-crystal silicon carbide, the apparatus comprising:
a crucible comprising:
a crucible vessel and a crucible cover, wherein
the crucible cover is configured for the attachment of a seed crystal to the crucible cover; and
the crucible vessel is configured to hold a silicon carbide raw material in the crucible vessel and sublimate the silicon carbide raw material to supply silicon carbide sublimation gas onto a seed crystal attached to the crucible cover, thereby growing single-crystal silicon carbide on the seed crystal, and wherein
the crucible vessel and the crucible cover each comprises threaded portions, configured to screw the crucible vessel and the crucible cover together, the threaded portion of the crucible vessel and/or the crucible cover comprising a sublimation gas discharge groove or grooves configured to regulate the sublimation gas flow rate by relative rotation of the threaded portions and a threaded portion driver for imparting relative rotation to the threaded portions,
wherein the sublimation gas discharge groove or grooves in the threaded portion of the crucible vessel and/or crucible cover have an opening area, and comprise a groove outlet side and a groove inlet side, wherein the opening area changes from the groove outlet side to the groove inlet side.
4. A method for producing single-crystal silicon carbide using the production apparatus of claim 3 , comprising:
subliming a silicon carbide raw material in a crucible vessel, thereby producing a silicon carbide sublimation gas,
depositing silicon carbide from the silicon carbide sublimation gas onto a seed crystal attached to a crucible cover screwed onto the crucible vessel, and growing single-crystal silicon carbide on the seed crystal, wherein
the discharge rate of sublimation gas to outside the crucible is varied during the single-crystal silicon carbide growth process.
5. The method for producing single-crystal silicon carbide as set out in claim 4 , further comprising gradually increasing the discharge rate of the sublimation gas from the crucible with crystal growth.
6. The crucible for producing single-crystal silicon carbide as set out in claim 1 , wherein the sublimation gas discharge groove or grooves in the threaded portion of the crucible vessel and/or crucible cover open along the circumferential direction of the threaded portion and the total length of the longest portion of the opening width thereof is not less than ¼ to not greater than 9/10 the threaded portion perimeter length.