IP Library Granted Patent US 12,188,135
Granted Patent B2
US 12,188,135 · App. 17/279,670 · Granted Jan 7, 2025

Fluorine gas production device

Inventors: Yohsuke Fukuchi (Tokyo, JP); Nozomi Kusumoto (Tokyo, JP); Hiroshi Kobayashi (Tokyo, JP)
Assignee: Resonac Corporation
C25B1/245C25B9/19C25B9/65C25B9/67C25B11/02C25B11/046C25B13/00
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Quick Facts
Patent No.
US 12,188,135
App. No.
17/279,670
Granted
Jan 7, 2025
Kind
B2
Abstract

A fluorine gas production device includes an electrolytic cell, a partition wall extending downward in the vertical direction from the ceiling surface inside the electrolytic cell to partition the electrolytic cell into an anode chamber and a cathode chamber, an anode, and a cathode. The lower end of the partition wall is immersed in the electrolytic solution and a length in the vertical direction of a portion immersed in the electrolytic solution of the partition wall is from 10% to 30% of the distance from the bottom surface inside the electrolytic cell to the liquid level of the electrolytic solution. The cathode is completely immersed in the electrolytic solution and the upper end of the cathode is arranged at a lower position in the vertical direction relative to the lower end of the partition wall. The anode is partially exposed from the liquid level of the electrolytic solution.

Claims (62)

1. A fluorine gas production device electrolyzing an electrolytic solution containing hydrogen fluoride to electrolytically synthesize fluorine gas comprising:

an electrolytic cell configured to store the electrolytic solution;

a cylindrical partition wall configured to extend downward in a vertical direction from a ceiling surface inside the electrolytic cell to partition an inside of the electrolytic cell into an anode chamber and a cathode chamber;

an anode configured to be disposed in the anode chamber;

a cathode configured to be disposed facing the anode; and

a cathode connection member configured to supply power to the cathode,

wherein

a lower end of the partition wall is immersed in the electrolytic solution,

a length in the vertical direction of a portion immersed in the electrolytic solution of the partition wall is 10% or more and 30% or less of a distance from a bottom surface inside the electrolytic cell to a liquid level of the electrolytic solution,

the cathode is completely immersed in the electrolytic solution,

an upper end of the cathode is arranged at a same position in the vertical direction as a position of the lower end of the partition wall or at a lower position in the vertical direction relative to the lower end of the partition wall,

the anode is placed to be partially exposed from the liquid level of the electrolytic solution,

the cathode connection member has one end physically connected to a bottom wall or a portion at a lower position in the vertical direction relative to the lower end of the partition wall of a side wall of the electrolytic cell and another end connected to the cathode,

the cathode connection member is a pipe used for cooling,

a portion of the cathode facing the anode is constituted by a flat plate or a flat plate including a through-hole with an opening ratio of 20% or less, and

the liquid level of the electrolytic solution is maintained by replenishing hydrogen fluoride.

2. The fluorine gas production device according to claim 1 further comprising:

an anode connection member configured to supply power to the anode, wherein

the anode connection member has one end connected to a positive electrode of a direct-current power supply and another end penetrating a wall body of the electrolytic cell to be connected to the anode,

the anode connection member and the electrolytic cell are insulated from each other,

and

the electrolytic cell and a negative electrode of the direct-current power supply are connected to each other.

3. The fluorine gas production device according to claim 1 , wherein

the cathode connection member is a metal pipe allowing circulation of a fluid.

4. The fluorine gas production device according to claim 1 , wherein

the anode and the cathode have a flat plate shape,

a plate surface of the anode, a plate surface of the cathode, a wall of the partition wall facing the plate surface of the anode, and a side surface inside the electrolytic cell facing the plate surface of the anode are provided to be parallel in the vertical direction,

a shortest distance A between the anode and the cathode is 2.0 cm or more and 5.0 cm or less,

a shortest distance B between the anode and the partition wall is 0.5 cm or more and 2.5 cm or less and is smaller than the shortest distance A, and

a shortest distance C between a portion not facing the cathode of the anode and the side surface inside the electrolytic cell is 1.5 times or more and 3 times or less the shortest distance A.

5. The fluorine gas production device according to claim 1 , wherein

the bottom surface inside the electrolytic cell is covered with an electrically insulating layered member formed of fluororesin or ceramic.

6. The fluorine gas production device according to claim 1 , wherein

the portion of the cathode facing the anode is formed of at least one type of material selected from Monel (Trademark), nickel, and copper.

7. The fluorine gas production device according to claim 1 not comprising:

a diaphragm configured to extend downward in the vertical direction from the partition wall to partition the inside of the electrolytic cell into the anode chamber and the cathode chamber.

8. The fluorine gas production device according to claim 2 , wherein

the anode and the cathode have a flat plate shape,

a plate surface of the anode, a plate surface of the cathode, a wall of the partition wall facing the plate surface of the anode, and a side surface inside the electrolytic cell facing the plate surface of the anode are provided to be parallel in the vertical direction,

a shortest distance A between the anode and the cathode is 2.0 cm or more and 5.0 cm or less,

a shortest distance B between the anode and the partition wall is 0.5 cm or more and 2.5 cm or less and is smaller than the shortest distance A, and

a shortest distance C between a portion not facing the cathode of the anode and the side surface inside the electrolytic cell is 1.5 times or more and 3 times or less the shortest distance A.

9. The fluorine gas production device according to claim 3 , wherein

the anode and the cathode have a flat plate shape,

a plate surface of the anode, a plate surface of the cathode, a wall of the partition wall facing the plate surface of the anode, and a side surface inside the electrolytic cell facing the plate surface of the anode are provided to be parallel in the vertical direction,

a shortest distance A between the anode and the cathode is 2.0 cm or more and 5.0 cm or less,

a shortest distance B between the anode and the partition wall is 0.5 cm or more and 2.5 cm or less and is smaller than the shortest distance A, and

a shortest distance C between a portion not facing the cathode of the anode and the side surface inside the electrolytic cell is 1.5 times or more and 3 times or less the shortest distance A.

10. The fluorine gas production device according to claim 2 , wherein

the bottom surface inside the electrolytic cell is covered with an electrically insulating layered member formed of fluororesin or ceramic.

11. The fluorine gas production device according to claim 3 , wherein

the bottom surface inside the electrolytic cell is covered with an electrically insulating layered member formed of fluororesin or ceramic.

12. The fluorine gas production device according to claim 4 , wherein

the bottom surface inside the electrolytic cell is covered with an electrically insulating layered member formed of fluororesin or ceramic.

13. The fluorine gas production device according to claim 2 , wherein

a portion facing the anode of the cathode is formed of at least one type of material selected from Monel (Trademark), nickel, and copper.

14. The fluorine gas production device according to claim 3 , wherein

a portion facing the anode of the cathode is formed of at least one type of material selected from Monel (Trademark), nickel, and copper.

15. The fluorine gas production device according to claim 4 , wherein

a portion facing the anode of the cathode is formed of at least one type of material selected from Monel (Trademark), nickel, and copper.

16. The fluorine gas production device according to claim 5 , wherein

a portion facing the anode of the cathode is formed of at least one type of material selected from Monel (Trademark), nickel, and copper.

Assignments (3)
CHANGE OF ADDRESS Recorded Feb 9, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066547/0677 →
CHANGE OF NAME Recorded Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 25, 2021
From: FUKUCHI, YOHSUKE; KUSUMOTO, NOZOMI; KOBAYASHI, HIROSHI
To: SHOWA DENKO K.K.
Reel/Frame 055714/0744 →
Priority Claims (1)
JP 2018-200220 · Oct 24, 2018 · national
Continuity (1)
Related Publication 20210395901A1 · Dec 23, 2021
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