SiC single crystal manufacturing apparatus and structure having container and filler for manufacturing SiC single crystal
A SiC single crystal manufacturing apparatus of the present invention includes a growth container having a growth space in which a SiC single crystal is grown in a first direction and a heat insulating material which covers the growth container and includes a plurality of units, and the plurality of units include a first unit and a second unit having at least a thermal conductivity different from that of the first unit, and the first unit includes a container made of at least one of graphite and a metal carbide and a filler filled into the container in a replaceable manner.
1. A SiC single crystal manufacturing apparatus, comprising:
a growth container having a growth space in which a SiC single crystal is able to grow in a first direction therein; and
a heat insulating material which covers the growth container and includes a plurality of units,
wherein the plurality of units include a first unit and a second unit having at least a thermal conductivity different from that of the first unit,
wherein the first unit includes a container made of at least one of graphite and a metal carbide and a filler filled into the container in a replaceable manner, and
wherein the filler is a powder material formed with SiC or metal carbide.
2. The SiC single crystal manufacturing apparatus according to claim 1 ,
wherein the powder material formed with SiC or metal carbide has shape anisotropy.
3. The SiC single crystal manufacturing apparatus according to claim 1 ,
wherein the first unit has anisotropy in thermal conductivity.
4. The SiC single crystal manufacturing apparatus according to claim 1 ,
wherein the first unit has a lower thermal conductivity than the second unit,
wherein the first unit covers the outside of a lower wall that faces an upper wall of the growth container in which a single crystal is provided in the first direction, and
wherein the second unit covers the outside of a side wall of the growth container in a radial direction intersecting the first direction.
5. The SiC single crystal manufacturing apparatus according to claim 1 ,
wherein the first unit has a higher thermal conductivity than the second unit,
wherein the first unit covers the outside of an upper wall of the growth container in which a single crystal is provided in the first direction, and
wherein the second unit covers the outside of a lower wall of the growth container that faces the upper wall in the first direction.
6. The SiC single crystal manufacturing apparatus according to claim 1 ,
wherein the first unit has a lower thermal conductivity than the second unit,
wherein the first unit covers the outside of a first part that overlaps a single crystal on the upper wall of the growth container in which the single crystal is provided, in a plan view in the first direction, and
wherein the second unit covers the outside of a second part other than the first part on the upper wall of the growth container on which the single crystal is provided.
7. The SiC single crystal manufacturing apparatus according to claim 1 ,
wherein the first unit has a higher thermal conductivity than the second unit,
wherein the first unit covers the outside of a first part on the upper wall of the growth container that overlaps a single crystal provided in the growth container, in a plan view in the first direction, and
wherein the second unit covers the outside of a second part other than the first part on the upper wall of the growth container in which the single crystal is provided.
8. The SiC single crystal manufacturing apparatus according to claim 1 ,
wherein the container is made of a metal carbide.
9. The SiC single crystal manufacturing apparatus according to claim 1 ,
wherein the first unit is made of the container and the filler.