Method for producing decomposing/cleaning composition
Provided is a method for producing a decomposing/cleaning composition which improves etching speed retention. In particular, a method for producing a decomposing/cleaning composition which contains (A) an N-substituted amide compound in which a hydrogen atom is not directly bonded to a nitrogen atom and (B) a quaternary alkyl ammonium fluoride or a hydrate thereof is provided, the method having a preparation step for mixing the (A) and (B) components in an inert gas atmosphere.
1 . A method for producing a decomposing cleaning composition comprising (A) an N-substituted amide compound in which no hydrogen atom is directly bonded to a nitrogen atom, and (B) a quaternary alkylammonium fluoride or a hydrate thereof, the method comprising:
a preparation step of mixing the (A) and the (B) under an inert gas atmosphere, and
an encapsulation step of enclosing the prepared decomposing cleaning composition in a container under an inert gas atmosphere after the preparation step.
2 . The method for producing the decomposing cleaning composition according to claim 1 , wherein the decomposing cleaning composition further comprises (C) an ether compound, and wherein the method comprises a preparation step of mixing the (A) to the (C) under an inert gas atmosphere, and an encapsulation step of enclosing the prepared decomposing cleaning composition in a container under an inert gas atmosphere after the preparation step.
3 . The method for producing the decomposing cleaning composition according to claim 1 , wherein the inert gas in the preparation step is nitrogen gas.
4 . The method for producing the decomposing cleaning composition according to claim 2 , wherein the (C) ether compound comprises a dialkyl ether of glycol selected from diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, tripropylene glycol dimethyl ether, tripropylene glycol diethyl ether, tripropylene glycol di(n-butyl) ether, tetraethylene glycol dimethyl ether, and tetrapropylene glycol dimethyl ether.
5 . The method for producing the decomposing cleaning composition according to claim 1 , wherein the inert gas in the encapsulation step is nitrogen gas.
6 . The method for producing the decomposing cleaning composition according to claim 1 , wherein the (A) N-substituted amide compound is a 2-pyrrolidone derivative compound represented by formula (1):
wherein, in formula (1), R 1 represents an alkyl group having 1 to 4 carbon atoms.
7 . The method for producing the decomposing cleaning composition according to claim 6 , wherein the (A) N-substituted amide compound is a 2-pyrrolidone derivative compound wherein R 1 in formula (1) is a methyl group or an ethyl group.
8 . The method for producing the decomposing cleaning composition according to claim 2 , wherein the (C) ether compound comprises a dialkyl ether of glycol represented by formula (2):
R 2 O(C n H 2n O) x R 3 (2),
wherein, in formula (2), R 2 and R 3 each independently represent an alkyl group selected from the group consisting of a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a t-butyl group, n is 2 or 3, and x is an integer of 1 to 4.
9 . The method for producing the decomposing cleaning composition according to claim 8 , wherein the dialkyl ether of glycol is dipropylene glycol dimethyl ether.
10 . The method for producing the decomposing cleaning composition according to claim 2 , wherein the (C) ether compound comprises a dialkyl ether represented by formula (3):
R 4 OR 5 (3),
wherein, in the formula, R 4 and R 5 each independently represent an alkyl group having 4 to 8 carbon atoms.
11 . The method for producing the decomposing cleaning composition according to claim 10 , wherein the dialkyl ether is dibutyl ether.
12 . The method for preparing the decomposing cleaning composition according to claim 1 , wherein the (B) quaternary alkylammonium fluoride is a tetraalkylammonium fluoride represented by R 6 R 7 R 8 R 9 N + F − , wherein R 6 to R 9 are each independently an alkyl group selected from the group consisting of a methyl group, an ethyl group, an n-propyl group, an isopropyl group, and an n-butyl group.
13 . The method for producing the decomposing cleaning composition according to claim 1 , wherein the decomposing cleaning composition is a decomposing cleaning composition for an adhesive polymer.
14 . The method for producing the decomposing cleaning composition according to claim 13 , wherein the adhesive polymer is a polyorganosiloxane compound.
15 . The method for producing the decomposing cleaning composition according to claim 2 , wherein the (A) N-substituted amide compound is a 2-pyrrolidone derivative compound represented by formula (1):
wherein, in formula (1), R 1 represents an alkyl group having 1 to 4 carbon atoms.
16 . The method for producing the decomposing cleaning composition according to claim 4 , wherein the (A) N-substituted amide compound is a 2-pyrrolidone derivative compound represented by formula (1):
wherein, in formula (1), R 1 represents an alkyl group having 1 to 4 carbon atoms.
17 . The method for producing the decomposing cleaning composition according to claim 8 , wherein the (C) ether compound comprises a dialkyl ether represented by formula (3):
R 4 OR 5 (3),
wherein, in the formula, R 4 and R 5 each independently represent an alkyl group having 4 to 8 carbon atoms.
18 . The method for producing the decomposing cleaning composition according to claim 4 , wherein the (C) ether compound comprises a dialkyl ether represented by formula (3):
R 4 OR 5 (3),
wherein, in the formula, R 4 and R 5 each independently represent an alkyl group having 4 to 8 carbon atoms.