Patent Assignment
Reel/Frame 029089/0227
Assignment of Assignor's Interest
Recorded: 2012-10-08
Pages: 8
Assignors
SASAKI, MASARU
Executed: 2012-09-07
MOYAMA, KAZUKI
Executed: 2012-09-07
INOUE, MASAKI
Executed: 2012-09-06
NOTO, YOKO
Executed: 2012-10-01
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Plasma Etching Method, Method for Producing Semiconductor Device, and Plasma Etching Device