IP Library › Assignment 029158/0809
Patent Assignment
Reel/Frame 029158/0809

Assignment of Assignor's Interest

Recorded: 2012-10-19 Pages: 4
Assignors
CHANG, CHUN-WEI
Executed: 2012-08-31
WANG, CHIH-CHIEN
Executed: 2012-08-31
MO, WANG-PEN
Executed: 2012-08-31
HSIEH, HUNG-CHANG
Executed: 2012-09-03
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
Method of Forming a Photoresist Layer
Patent: 9,028,915 →
Application: 13/602,465 →
Publication: US 2014/0065843