IP Library Assignment 029666/0212
Patent Assignment
Reel/Frame 029666/0212

Assignment of Assignor's Interest

Recorded: 2013-01-22 Pages: 3
Assignors
KAWANAMI, YOSHIMI
Executed: 2012-11-26
MATSUBARA, SHINICHI
Executed: 2012-11-29
MORITANI, HIRONORI
Executed: 2012-11-27
ARAI, NORIAKI
Executed: 2012-11-26
SHICHI, HIROYASU
Executed: 2012-11-29
HASHIZUME, TOMIHIRO
Executed: 2012-11-30
KAGA, HIROYASU
Executed: 2012-11-26
SAHO, NORIHIDE
Executed: 2012-12-08
MUTO, HIROYUKI
Executed: 2012-11-29
OSE, YOICHI
Executed: 2012-11-26
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Gas Field Ion Source and Method for Using Same, Ion Beam Device, and Emitter Tip and Method for Manufacturing Same
Patent: 8,847,173 →
Application: 13/811,392 →
Publication: US 2013/0119252
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →