IP Library Assignment 029769/0939
Patent Assignment
Reel/Frame 029769/0939

Assignment of Assignor's Interest

Recorded: 2013-02-07 Pages: 2
Assignors
YOSHIDA, ATSUSHI
Executed: 2012-12-19
YAMAMOTO, NAOHIRO
Executed: 2012-12-19
SUYAMA, MAKOTO
Executed: 2012-12-19
YAMADA, KENTARO
Executed: 2012-12-19
FUJITA, DAISUKE
Executed: 2012-12-19
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Etching Method
Patent: 9,017,564 →
Application: 13/761,235 →
Publication: US 2014/0144873
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →