Patent Assignment
Reel/Frame 029770/0152
Assignment of Assignor's Interest
Recorded: 2013-02-07
Pages: 2
Assignors
UNE, SATOSHI
Executed: 2012-12-25
ISHIMURA, HIROAKI
Executed: 2012-12-25
MATSUDA, KOUHEI
Executed: 2012-12-25
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Plasma Etching Method
Application:
13/761,249 →
Publication:
US 2014/0151327
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.