IP Library Assignment 052220/0045
Patent Assignment
Reel/Frame 052220/0045

Change of Name

Recorded: 2020-03-25 Pages: 10
Assignor
Assignee
HITACHI HIGH-TECH CORPORATION
17-1, TORANOMON 1-CHOME, MINATO-KU, TOKYO, 105-6409, JAPAN
Covered Properties (43)
Plasma processing apparatus
Application: 11/798,646 →
Publication: US 2008/0017107
Vacuum Processing Apparatus
Application: 12/041,029 →
Publication: US 2009/0214399
Method for Diagnosing Depression
Application: 12/048,241 →
Publication: US 2008/0281531
Plasma Processing Apparatus
Application: 12/368,412 →
Publication: US 2010/0126666
Plasma Processing Apparatus and Plasma Processing Method
Application: 12/538,201 →
Publication: US 2010/0326957
Plasma Processing Apparatus
Application: 12/685,688 →
Publication: US 2010/0230053
Plasma Processing Apparatus Using Transmission Electrode
Application: 12/709,149 →
Publication: US 2011/0030899
Defect Check Method and Device Thereof
Application: 13/058,223 →
Publication: US 2011/0182496
Measuring Method of Pattern Dimension and Scanning Electron Microscope Using Same
Application: 13/126,768 →
Publication: US 2011/0208477
Plasma Processing Apparatus
Application: 13/190,654 →
Publication: US 2012/0267050
Plasma Processing Apparatus
Application: 13/209,523 →
Publication: US 2013/0000847
Plasma Processing Apparatus
Application: 13/230,214 →
Publication: US 2012/0000774
Fluorescent Analysis Method
Application: 13/378,058 →
Publication: US 2012/0126142
Device for Bacteria Classification and Pretreatment Device for Bacteria Test
Application: 13/389,824 →
Publication: US 2012/0258525
Inspection Device and Method
Application: 13/390,973 →
Publication: US 2012/0144938
Plasma Processing Apparatus
Application: 13/570,471 →
Publication: US 2013/0160949
Biopolymer Analysis Method, Biopolymer Analyzer, and Biopolymer Analysis Chip
Application: 13/579,329 →
Publication: US 2012/0312083
Nucleic Acid Analysis Device, Method for Producing Same, and Nucleic Acid Analyzer
Application: 13/697,019 →
Publication: US 2013/0053280
Far Infrared Imaging Device and Imaging Method Using Same
Application: 13/702,594 →
Publication: US 2013/0088590
Plasma Etching Method
Application: 13/761,249 →
Publication: US 2014/0151327
Plasma Processing Apparatus and Microwave Output Device
Application: 13/787,950 →
Publication: US 2014/0042155
Plasma Processing Apparatus and Sample Stage Thereof
Application: 13/798,270 →
Publication: US 2014/0216657
Nucleic Acid Analysis Device, Nucleic Acid Analysis Apparatus, and Nucleic Acid Analysis Method
Application: 13/818,704 →
Publication: US 2013/0157264
Apparatus for Evaluating Lubricant
Application: 13/872,950 →
Publication: US 2013/0239663
Scanning Electron Microscope and Length Measuring Method Using the Same
Application: 13/993,829 →
Publication: US 2013/0292568
Electron Microscope
Application: 14/002,141 →
Publication: US 2014/0103208
Cell-Adhesive Photocontrollable Base Material
Application: 14/002,192 →
Publication: US 2014/0011960
Nucleic Acid Analysis Device, Nucleic Acid Analysis Apparatus, and Nucleic Acid Analysis Method
Application: 14/051,540 →
Publication: US 2014/0038274
Surface Defect Inspection Method and Apparatus
Application: 14/189,921 →
Publication: US 2014/0176943
Plasma Processing Apparatus and Plasma Processing Method
Application: 15/056,142 →
Publication: US 2016/0181131
Plasma Processing Apparatus
Application: 15/091,730 →
Publication: US 2016/0225587
Dry Etching Method
Application: 15/196,284 →
Publication: US 2016/0307765
Plasma Processing Apparatus and Plasma Processing Method
Application: 15/284,668 →
Publication: US 2017/0025289
Device for Storing Biochemical Reagents, and Biochemical Analyzer
Application: 15/309,550 →
Publication: US 2017/0138974
Cell Culture Device and Image Analysis Device
Application: 15/325,670 →
Publication: US 2017/0159004
Defect Observation Method and Defect Observation Device
Application: 15/522,143 →
Publication: US 2017/0328842
Plasma Processing Apparatus and Microwave Output Device
Application: 15/670,194 →
Publication: US 2017/0367169
Data Processing Method, Data Processing Apparatus and Processing Apparatus
Application: 16/053,158 →
Publication: US 2018/0341625
Plasma Processing Apparatus and Sample Stage Thereof
Application: 16/169,085 →
Publication: US 2019/0057846
Plasma Processing Apparatus and Method
Application: 16/218,703 →
Publication: US 2019/0115193
Analysis Method and Semiconductor Etching Apparatus
Application: 16/281,652 →
Publication: US 2019/0189397
Plasma Processing Apparatus
Application: 16/669,711 →
Publication: US 2020/0066487
Plasma Processing Apparatus
Application: 16/749,180 →
Publication: US 2020/0161092
Related Assignments (24)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Jul 8, 2008
From: YATOMI, MINORU; MAKINO, AKITAKA; KIMURA, SHINGO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 021206/0665 →
Assignment of Assignor's Interest Sep 16, 2008
From: ROKUTAN, KAZUHITO; OHMORI, TETSURO; SAITO, TOSHIRO; OHTA, MASAYUKI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION; SYSMEX CORPORATION
Reel/Frame 021534/0907 →
Assignment of Assignor's Interest Apr 30, 2009
From: TANDOU, TAKUMI; YOKOGAWA, KENETSU; IZAWA, MASARU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 022620/0431 →
Assignment of Assignor's Interest Oct 23, 2009
From: MAEDA, KENJI; YOKOGAWA, KENETSU; TAMURA, TOMOYUKI; HIROZANE, KAZUYUKI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 023413/0595 →
Assignment of Assignor's Interest May 4, 2010
From: SUZUKI, KEIZO; IZAWA, MASARU; NEGISHI, NOBUYUKI; YOKOGAWA, KENETSU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 024328/0698 →
Assignment of Assignor's Interest May 20, 2010
From: NISHIO, RYOJI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 024413/0564 →
Assignment of Assignor's Interest Apr 15, 2011
From: SAKAI, KAORU; MAEDA, SHUNJI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 026133/0221 →
Assignment of Assignor's Interest Apr 29, 2011
From: HITOMI, KEIICHIRO; NAKAYAMA, YOSHINORI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 026199/0021 →
Assignment of Assignor's Interest Jul 26, 2011
From: SAKKA, YUSAKU; NISHIO, RYOJI; KAWAGUCHI, TADAYOSHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 026648/0278 →
Assignment of Assignor's Interest Aug 15, 2011
From: TETSUKA, TSUTOMU; NISHIO, RYOJI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 026748/0076 →
Assignment of Assignor's Interest Dec 14, 2011
From: MATSUI, TAKUYA; INABE, RYOJI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 027380/0900 →
Corrective Assignment to Correct the Original Electronic Cover Sheet, the 2ND Inventor's Name Is Misspelled, Previously Recorded on Reel 027380 Frame 0900. Assignor(S) Hereby Confirms the Assignment. Dec 28, 2011
From: MATSUI, TAKUYA; INABA, RYOJI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 027456/0196 →
Assignment of Assignor's Interest Feb 17, 2012
From: IIZUMI, NORIKO; MAEKAWA, AKIRA
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 027722/0893 →
Assignment of Assignor's Interest Feb 17, 2012
From: INAGAKI, KATSUYASU; AIKO, KENJI; KAMADA, MASARU; KUBO, TOSHIRO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 027722/0132 →
Assignment of Assignor's Interest Aug 9, 2012
From: SAKKA, YUSAKU; NISHIO, RYOJI; KAWAGUCHI, TADAYOSHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 028756/0799 →
Assignment of Assignor's Interest Aug 16, 2012
From: AKAHORI, RENA; ANAZAWA, TAKASHI; OZAWA, SATOSHI; YAZAWA, YOSHIAKI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 028796/0732 →
Corrective Assignment to Correct the Original Electronic Cover Sheet, the Assignee's Address Is Incorrect, Previously Recorded on Reel 028756 Frame 0799. Assignor(S) Hereby Confirms the Assignment. Aug 23, 2012
From: SAKKA, YUSAKU; NISHIO, RYOJI; KAWAGUCHI, TADAYOSHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 028840/0263 →
Assignment of Assignor's Interest Nov 9, 2012
From: HAMASAKI, KOSHIN; SAITO, TOSHIRO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 029268/0101 →
Assignment of Assignor's Interest Dec 7, 2012
From: SHIMURA, KEI; NAKAI, NAOYA
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 029423/0414 →
Assignment of Assignor's Interest Feb 7, 2013
From: UNE, SATOSHI; ISHIMURA, HIROAKI; MATSUDA, KOUHEI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 029770/0152 →
Assignment of Assignor's Interest Feb 25, 2013
From: OBARA, TAKAYUKI; IMAI, KAZUMICHI; SAITO, TOSHIRO; TAKAHASHI, SATOSHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 029864/0811 →
Assignment of Assignor's Interest Apr 19, 2013
From: YAMAMOTO, KOICHI; ITOU, ATSUSHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 030250/0716 →
Assignment of Assignor's Interest May 3, 2013
From: KUSUMOTO, HIRONORI; OHMOTO, YUTAKA; NAKAMOTO, KAZUNORI; NAGAI, KOJI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 030341/0539 →
Assignment of Assignor's Interest Jul 24, 2013
From: BIZEN, DAISUKE; MAKINO, HIROSHI; TANAKA, JUNICHI; EZUMI, MAKOTO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 030866/0571 →