VACUUM PROCESSING APPARATUS
The invention provides a vacuum processing apparatus for processing a sample placed within a processing chamber in a vacuum reactor using plasma generated within the processing chamber, the apparatus comprising an atmospheric transfer chamber disposed on a front portion of the apparatus for transferring the sample under atmospheric pressure, a vacuum transfer chamber arranged on a rear side of the atmospheric transfer chamber for transferring the sample in the inner side of the chamber being vacuumed, a lock chamber disposed between and connecting the vacuum transfer chamber and the atmospheric transfer chamber, a plurality of vacuum processing units including vacuum reactors and arranged in the circumference of and connected to the vacuum transfer chamber, and a plurality of flow controllers arranged in a space below the vacuum transfer chamber or the lock chamber for controlling flow rates of a plurality of gases for processing the sample to be supplied respectively to the vacuum processing units.
1 . A vacuum processing apparatus for processing a sample placed within a processing chamber in a vacuum reactor using plasma generated within the processing chamber, the apparatus comprising:
an atmospheric transfer chamber disposed on a front portion of the apparatus for transferring the sample under atmospheric pressure;
a vacuum transfer chamber arranged on a rear side of the atmospheric transfer chamber for transferring the sample in the inner side of the chamber being vacuumed;
a lock chamber disposed between and connecting the vacuum transfer chamber and the atmospheric transfer chamber;
a plurality of vacuum processing units including vacuum reactors and arranged in the circumference of and connected to the vacuum transfer chamber; and
a plurality of flow controllers arranged in a space below the vacuum transfer chamber or the lock chamber for controlling flow rates of a plurality of gases to be supplied respectively to the vacuum processing units for processing the sample.
2 . The vacuum processing apparatus according to claim 1 , wherein
the vacuum transfer chamber is disposed in a reactor having a polygonal planar shape and having vacuum processing units attached in a removable manner to side walls constituting the polygonal sides of the reactor.
3 . The vacuum processing apparatus according to claim 1 or claim 2 , further comprising a gas distributor disposed between the atmospheric transfer chamber and the vacuum processing unit arranged on the rear side of the atmospheric transfer chamber, and connected to a plurality of pipes for gases supplied from below a floor surface on which the vacuum processing apparatus is installed for distributing the plurality of gases to the plurality of flow controllers, respectively.
4 . The vacuum processing apparatus according to any one of claims 1 or 2 , wherein the center portions of the processing chambers within the plurality of vacuum processing units are arranged circumferentially around a vertical center axis of the vacuum transfer chamber, and the plurality of flow controllers are arranged below the vacuum transfer chamber circumferentially around the vertical axis and in an order corresponding to the circumferential position of the corresponding vacuum processing units.
5 . The vacuum processing apparatus according to claim 3 , wherein the center portions of the processing chambers within the plurality of vacuum processing units are arranged circumferentially around a vertical center axis of the vacuum transfer chamber, and the plurality of flow controllers are arranged below the vacuum transfer chamber circumferentially around the vertical axis and in an order corresponding to the circumferential position of the corresponding vacuum processing units.
6 . The vacuum processing apparatus according to any one of claims 1 or 2 , wherein upper surfaces of the plurality of flow controllers are composed of planes of the same height, and a space in which a worker can perform operation is provided between the vacuum transfer chamber and the plurality of flow controllers.
7 . The vacuum processing apparatus according to claim 3 , wherein upper surfaces of the plurality of flow controllers are composed of planes of the same height, and a space in which a worker can perform operation is provided between the vacuum transfer chamber and the plurality of flow controllers.
8 . The vacuum processing apparatus according to claim 4 , wherein upper surfaces of the plurality of flow controllers are composed of planes of the same height, and a space in which a worker can perform operation is provided between the vacuum transfer chamber and the plurality of flow controllers.