IP Library Patent Application 13787950
Patent Application
App. No. 13/787,950

PLASMA PROCESSING APPARATUS AND MICROWAVE OUTPUT DEVICE

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Patent No.
US None
App. No.
13/787,950
Abstract

A plasma processing apparatus includes: a high voltage power supply for supplying a high voltage power to a magnetron; and a detector for detecting a microwave output from the magnetron, wherein based on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of a current detected from an output of the high voltage power supply, with a setting value of the output of the high voltage power supply, the output of the high voltage power supply is adjusted.

Claims (20)

1 . A plasma processing apparatus that forms plasma inside a processing chamber using microwave formed by a magnetron and processes a wafer arranged inside the processing chamber, the plasma processing apparatus comprising:

a high voltage power supply for supplying a high voltage power to the magnetron; and

a detector for detecting a microwave output from the magnetron, wherein

based on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of a current detected from an output of the high voltage power supply, with a setting value of the output of the high voltage power supply, the output of the high voltage power supply is adjusted.

2 . The plasma processing apparatus according to claim 1 , wherein based on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of an anode current output from the high voltage power supply, with a setting value of an output of the high voltage power supply, the output of the high voltage power supply is adjusted.

3 . A plasma processing apparatus that forms plasma inside a processing chamber using microwave formed by a magnetron and processes a wafer arranged inside the processing chamber, the plasma processing apparatus comprising:

a high voltage power supply for supplying a high voltage power to the magnetron: and

a detector for detecting a microwave output from the magnetron, wherein

based on a result of comparing a signal, which is obtained as a result of comparing an output from the detector with a setting value of an output of the high voltage power supply, with a signal indicative of a value of a current detected from the output of the high voltage power supply, the output of the high voltage power supply is adjusted.

4 . The plasma processing apparatus according to claim 1 , wherein a signal obtained by detecting an AC component of a current from an output of the high voltage power supply is output as an alarm signal.

5 . A microwave output device used for a plasma processing apparatus that forms plasma inside a processing chamber using microwave formed by a magnetron and processes a wafer arranged inside the processing chamber, the microwave output device comprising:

a high voltage power supply for supplying a high voltage power to the magnetron; and

a detector for detecting a microwave output from the magnetron, wherein

based on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of a current detected from an output of the high voltage power supply, with a setting value of the output of the high voltage power supply, the output of the high voltage power supply is adjusted.

6 . The microwave output device according to claim 5 , wherein based on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of an anode current output from the high voltage power supply, with a setting value of an output of the high voltage power supply, the output of the high voltage power supply is adjusted.

7 . A microwave output device used for a plasma processing apparatus that forms plasma inside a processing chamber using microwave formed by a magnetron and processes a wafer arranged inside the processing chamber, the microwave output device comprising:

a high voltage power supply for supplying a high voltage power to the magnetron; and

a detector for detecting a microwave output from the magnetron, wherein

based on a result of comparing a signal, which is obtained as a result of comparing an output from the detector with a setting value of an output of the high voltage power supply, with a signal indicative of a value of a current detected from the output of the high voltage power supply, the output of the high voltage power supply is adjusted.

8 . The microwave output device according to claim 5 , wherein a signal obtained by detecting an AC component of the current from the output of the high voltage power supply is output as an alarm signal.

Assignments (2)
CHANGE OF NAME Recorded Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052220/0045 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 19, 2013
From: YAMAMOTO, KOICHI; ITOU, ATSUSHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 030250/0716 →