IP Library › Assignment 029892/0380
Patent Assignment
Reel/Frame 029892/0380

Assignment of Assignor's Interest

Recorded: 2013-02-28 Pages: 2
Assignors
WATANABE, TOMOYUKI
Executed: 2012-11-19
MORIMOTO, MICHIKAZU
Executed: 2012-11-19
YAKUSHIJI, MAMORU
Executed: 2012-11-19
ONO, TETSUO
Executed: 2012-11-19
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Etching Method
Patent: 8,741,166 →
Application: 13/664,940 →
Publication: US 2013/0157470
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →