Patent Assignment
Reel/Frame 030616/0728
Assignment of Assignor's Interest
Recorded: 2013-06-14
Pages: 4
Assignors
TU, CHE-HAO
Executed: 2013-06-04
CHANG, CHIH-YU
Executed: 2013-06-05
HONG, WILLAM WEI-LUN
Executed: 2013-06-10
CHEN, YING-TSUNG
Executed: 2013-06-04
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO. 8, LI-HSIN ROAD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property
(1)
Mechanisms for Forming Oxide Layer Over Exposed Polysilicon During a Chemical Mechanical Polishing (Cmp) Process