IP Library Assignment 030654/0817
Patent Assignment
Reel/Frame 030654/0817

Assignment of Assignor's Interest

Recorded: 2013-06-20 Pages: 4
Assignors
MAEDA, KENJI
Executed: 2013-05-09
YOSHIOKA, KEN
Executed: 2013-05-23
KAWASAKI, HIROMICHI
Executed: 2013-05-14
SHIMOMURA, TAKAHIRO
Executed: 2013-05-29
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 8,951,385 →
Application: 13/864,317 →
Publication: US 2013/0267098
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →