IP Library › Assignment 030946/0640
Patent Assignment
Reel/Frame 030946/0640

Assignment of Assignor's Interest

Recorded: 2013-08-06 Pages: 4
Assignors
CHENG, WEN-LI
Executed: 2013-07-23
CHIH, MING-HUI
Executed: 2013-07-23
CHIANG, CHIA-PING
Executed: 2013-07-23
HSIEH, KEN-HSIEN
Executed: 2013-07-23
OU, TSONG-HUA
Executed: 2013-07-23
HUANG, WEN-CHUN
Executed: 2013-07-23
LIU, RU-GUN
Executed: 2013-07-23
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. VI, HSINCHU SCIENCE PARK, HSINCHU, 300, TAIWAN
Covered Property (1)
System and Method for Decomposition of a Single Photoresist Mask Pattern into 3 Photoresist Mask Patterns
Patent: 9,176,373 →
Application: 13/955,780 →
Publication: US 2015/0040083