IP Library Assignment 031116/0113
Patent Assignment
Reel/Frame 031116/0113

Assignment of Assignor's Interest

Recorded: 2013-08-30 Pages: 2
Assignors
NAKAMOTO, SHIGERU
Executed: 2013-07-10
USUI, TATEHITO
Executed: 2013-07-17
INOUE, SATOMI
Executed: 2013-07-10
HIROTA, KOUSA
Executed: 2013-07-17
FUKUCHI, KOUSUKE
Executed: 2013-07-10
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Application: 14/014,557 →
Publication: US 2014/0295583
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →