IP Library Assignment 031428/0087
Patent Assignment
Reel/Frame 031428/0087

Assignment of Assignor's Interest

Recorded: 2013-10-17 Pages: 5
Assignors
CHENG, DONG-HSU
Executed: 2013-04-15
CHEN, CHUN-JEN
Executed: 2013-04-15
TSAI, MING-HO
Executed: 2013-04-15
LIANG, JIM
Executed: 2013-04-15
CHEN, YUNG-HSIANG
Executed: 2013-04-15
CHENG, JUN-HUA
Executed: 2013-04-15
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
System and Method for Lithography Exposure with Correction of Overlay Shift Induced by Mask Heating
Patent: 9,081,293 →
Application: 14/056,576 →
Publication: US 2014/0272717