IP Library › Assignment 031428/0250
Patent Assignment
Reel/Frame 031428/0250

Assignment of Assignor's Interest

Recorded: 2013-10-17 Pages: 3
Assignors
CHING, KUO-CHENG
Executed: 2013-10-14
HSU, TING-HUNG
Executed: 2013-10-14
WANG, CHAO-HSIUNG
Executed: 2013-10-15
LIU, CHI-WEN
Executed: 2013-10-15
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
Fin Spacer Protected Source and Drain Regions in FinFETs
Patent: 9,147,682 →
Application: 14/056,649 →
Publication: US 2015/0108544
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 30, 2019
From: CHIANG, KUO-CHENG; HSU, TING-HUNG; WANG, CHAO-HSIUNG; LIU, CHI-WEN
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 051383/0740 →