Patent Assignment
Reel/Frame 051383/0740
Assignment of Assignor's Interest
Recorded: 2019-12-30
Pages: 3
Assignors
CHIANG, KUO-CHENG
Executed: 2019-09-18
HSU, TING-HUNG
Executed: 2019-09-18
WANG, CHAO-HSIUNG
Executed: 2019-09-18
LIU, CHI-WEN
Executed: 2019-09-18
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Properties
(3)
Fin Spacer Protected Source and Drain Regions in FinFETs
Fin Spacer Protected Source and Drain Regions in FinFETs
Fin Spacer Protected Source and Drain Regions in FinFETs
Related Assignments
(1)
Other recorded transfers of the patents in this record — the chain of ownership.