Patent Assignment
Reel/Frame 031474/0789
Assignment of Assignor's Interest
Recorded: 2013-10-25
Pages: 14
Assignors
LIN, CHING-LING
Executed: 2013-09-10
HUANG, CHIH-SEN
Executed: 2013-10-18
TSAO, PO-CHAO
Executed: 2013-10-18
HUNG, CHING-WEN
Executed: 2013-10-18
WU, JIA-RONG
Executed: 2013-09-10
LIN, CHIEN-TING
Executed: 2013-10-18
Assignee
UNITED MICROELECTRONICS CORP.
NO.3, LI-HSIN ROAD 2, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU CITY, TAIWAN
Covered Property
(1)
Method of Forming Self-Aligned Metal Gate Structure in a Replacement Gate Process Using Tapered Interlayer Dielectric
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.