IP Library › Assignment 031604/0040
Patent Assignment
Reel/Frame 031604/0040

Assignment of Assignor's Interest

Recorded: 2013-11-14 Pages: 5
Assignors
KIM, JINSU
Executed: 2013-11-11
JI, XIAOSONG
Executed: 2013-11-11
CHOI, JINHAN
Executed: 2013-11-11
KIM, HO JEONG
Executed: 2013-11-11
KONG, BYUNGKOOK
Executed: 2013-11-11
LEE, HOON SANG
Executed: 2013-11-11
Assignee
APPLIED MATERIALS, INC.
3050 BOWERS AVENUE, SANTA CLARA, CALIFORNIA, 95054
Covered Property (1)
Aspect Ratio Dependent Etch (Arde) Lag Reduction Process by Selective Oxidation with Inert Gas Sputtering
Patent: 9,064,812 →
Application: 14/072,430 →
Publication: US 2015/0064919