IP Library › Assignment 032062/0592
Patent Assignment
Reel/Frame 032062/0592

Assignment of Assignor's Interest

Recorded: 2014-01-28 Pages: 4
Assignors
OGIHARA, TSUTOMU
Executed: 2013-11-29
HATAKEYAMA, JUN
Executed: 2013-11-29
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Composition for Forming Resist Underlayer Film and Patterning Process
Patent: 9,315,670 →
Application: 14/165,921 →
Publication: US 2014/0235796